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表面电子掺杂和衬底对外延 FeSe 薄膜超导性的影响。

Effects of Surface Electron Doping and Substrate on the Superconductivity of Epitaxial FeSe Films.

机构信息

State Key Laboratory of Surface Physics, Department of Physics, and Advanced Materials Laboratory, Fudan University , Shanghai 200433, China.

Collaborative Innovation Center of Advanced Microstructures, Fudan University , Shanghai 200433, China.

出版信息

Nano Lett. 2016 Mar 9;16(3):1969-73. doi: 10.1021/acs.nanolett.5b05243. Epub 2016 Feb 11.

Abstract

Superconductivity in FeSe is greatly enhanced in films grown on SrTiO3 substrates, although the mechanism behind remains unclear. Recently, surface potassium (K) doping has also proven able to enhance the superconductivity of FeSe. Here, by using scanning tunneling microscopy, we compare the K doping dependence of the superconductivity in FeSe films grown on two substrates: SrTiO3 (001) and graphitized SiC (0001). For thick films (20 unit cells (UC)), the optimized superconducting (SC) gaps are of similar size (∼9 meV) regardless of the substrate. However, when the thickness is reduced to a few UC, the optimized SC gap is increased up to ∼15 meV for films on SrTiO3, whereas it remains unchanged for films on SiC. This clearly indicates that the FeSe/SrTiO3 interface can further enhance the superconductivity, beyond merely doping electrons. Intriguingly, we found that this interface enhancement decays exponentially as the thickness increases, with a decay length of 2.4 UC, which is much shorter than the length scale for relaxation of the lattice strain, pointing to interfacial electron-phonon coupling as the likely origin.

摘要

在 SrTiO3 衬底上生长的 FeSe 薄膜中,超导性大大增强,尽管其背后的机制仍不清楚。最近,表面钾(K)掺杂也被证明能够增强 FeSe 的超导性。在这里,我们通过使用扫描隧道显微镜,比较了在两种衬底上生长的 FeSe 薄膜的 K 掺杂对超导性的影响:SrTiO3(001)和石墨化 SiC(0001)。对于厚膜(20 个单位晶胞(UC)),无论衬底如何,优化的超导(SC)间隙大小相似(约 9 毫电子伏特)。然而,当厚度减小到几个 UC 时,在 SrTiO3 上生长的薄膜的优化 SC 间隙增加到约 15 毫电子伏特,而在 SiC 上生长的薄膜则保持不变。这清楚地表明,FeSe/SrTiO3 界面可以进一步增强超导性,而不仅仅是掺杂电子。有趣的是,我们发现这种界面增强随着厚度的增加呈指数衰减,衰减长度为 2.4UC,远短于晶格应变弛豫的长度尺度,表明界面电子-声子耦合可能是其起源。

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