Kimes W A, Sperling B A, Maslars J E
National Institute of Standards and Technology, Gaithersburg, MD 20899.
J Res Natl Inst Stand Technol. 2015 Apr 7;120:58-63. doi: 10.6028/jres.120.005. eCollection 2015.
The design and operation of a simple, optically-accessible modular reactor for probing thermal thin film deposition processes, such as atomic layer deposition processes (ALD) and chemical vapor deposition (CVD), is described. This reactor has a nominal footprint of 225 cm(2) and a mass of approximately 6.6 kg, making it small enough to conveniently function as a modular component of an optical train. The design is simple, making fabrication straightforward and relatively inexpensive. Reactor operation is characterized using two infrared absorption measurements to determine exhaust times for tetrakis(dimethylamino)titanium and water, proto-typical ALD precursors, in a pressure and flow regime commonly used for ALD.
本文描述了一种用于探测热薄膜沉积过程（如原子层沉积过程（ALD）和化学气相沉积（CVD））的简单、光学可访问的模块化反应器的设计与操作。该反应器的标称占地面积为225平方厘米，质量约为6.6千克，体积小到足以方便地用作光学系统的模块化组件。其设计简单，制造过程直接且成本相对较低。在通常用于ALD的压力和流量条件下，通过两次红外吸收测量来表征反应器的运行情况，以确定四（二甲基氨基）钛和水（典型的ALD前驱体）的排气时间。
