Zhang Junmei, Yang Zhiquan, Yang Zhuanyi, He Xinghui, Hou Yonghong, Wang Yanjin
Department of Neurosurgery, Xiangya Hospital, Central South University, 87 Xiangya Road, Changsha, 410008, Hunan, People's Republic of China.
Neurol Sci. 2016 Jul;37(7):1079-88. doi: 10.1007/s10072-016-2543-8. Epub 2016 Mar 10.
Schizencephaly is a rare malformation of cortical development resulting from cell migration defects that occur unilaterally or bilaterally. The type of the schizencephalic cleft can be open lip or closed lip. Patients suffering from refractory seizures secondary to schizencephaly should be considered for surgical treatment. In this paper, we retrospectively analyzed two patients with confirmed schizencephaly and intractable seizures. The evaluation methods included a medical history assessment, a neurological examination and magnetic resonance imaging (MRI). Continuous intracranial video-electroencephalogram (vEEG) monitoring with surface electrodes and deep electrodes was evaluated to confirm the epileptogenic zones associated with the schizencephalic lesions. Cortical electrical stimulation was performed to evaluate the neurophysiology of the relevant brain regions. Epileptic focus resection was performed close to the schizencephalic cleft according to the results of intracranial EEG and stimulation while preserving neurological functions. MRI revealed bilateral open lip schizencephaly in one patient and closed lip schizencephaly in the other patient. The epileptogenic zones were localized close to the schizencephalic clefts. The seizure outcome was Engel's class Ia in both patients at 1-year follow-up. No significant neurological deficits were found, and their activities of daily life were significantly improved. We conclude that abnormal cortex near the schizencephalic clefts may display an extrinsic epileptogenicity. Accurate localization of the epileptogenic zones using intracranial EEG and electrical stimulation can lead to a seizure-free outcome in patients with refractory epilepsy associated with schizencephaly.
脑裂畸形是一种罕见的皮质发育畸形,由单侧或双侧发生的细胞迁移缺陷引起。脑裂畸形的裂隙类型可为开放性唇裂或闭合性唇裂。因脑裂畸形继发难治性癫痫的患者应考虑手术治疗。在本文中,我们回顾性分析了2例确诊为脑裂畸形且伴有顽固性癫痫的患者。评估方法包括病史评估、神经学检查和磁共振成像(MRI)。采用头皮电极和深部电极进行连续颅内视频脑电图(vEEG)监测,以确定与脑裂畸形病变相关的致痫区。进行皮质电刺激以评估相关脑区的神经生理学。根据颅内脑电图和刺激结果,在保留神经功能的同时,在靠近脑裂畸形裂隙处进行癫痫灶切除术。MRI显示1例患者为双侧开放性唇裂脑裂畸形,另1例患者为闭合性唇裂脑裂畸形。致痫区定位于靠近脑裂畸形裂隙处。在1年的随访中,2例患者的癫痫发作结果均为Engel Ia级。未发现明显的神经功能缺损,他们的日常生活活动有显著改善。我们得出结论,脑裂畸形裂隙附近的异常皮质可能表现出外在致痫性。使用颅内脑电图和电刺激准确确定致痫区可使伴有脑裂畸形的难治性癫痫患者实现无癫痫发作的结果。