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高质量 ⟨100⟩ 外延 InP p-n 二极管纳米线的生长与特性研究。

High-Yield Growth and Characterization of ⟨100⟩ InP p-n Diode Nanowires.

机构信息

Department of Applied Physics, Eindhoven University of Technology , 5600 MB Eindhoven, The Netherlands.

Kavli Institute of Nanoscience, Delft University of Technology , 2628 CJ Delft, The Netherlands.

出版信息

Nano Lett. 2016 May 11;16(5):3071-7. doi: 10.1021/acs.nanolett.6b00203. Epub 2016 Apr 12.

Abstract

Semiconductor nanowires are nanoscale structures holding promise in many fields such as optoelectronics, quantum computing, and thermoelectrics. Nanowires are usually grown vertically on (111)-oriented substrates, while (100) is the standard in semiconductor technology. The ability to grow and to control impurity doping of ⟨100⟩ nanowires is crucial for integration. Here, we discuss doping of single-crystalline ⟨100⟩ nanowires, and the structural and optoelectronic properties of p-n junctions based on ⟨100⟩ InP nanowires. We describe a novel approach to achieve low resistance electrical contacts to nanowires via a gradual interface based on p-doped InAsP. As a first demonstration in optoelectronic devices, we realize a single nanowire light emitting diode in a ⟨100⟩-oriented InP nanowire p-n junction. To obtain high vertical yield, which is necessary for future applications, we investigate the effect of the introduction of dopants on the nanowire growth.

摘要

半导体纳米线在光电学、量子计算和热电学等许多领域都具有应用前景。纳米线通常在(111)取向的衬底上垂直生长,而(100)是半导体技术的标准。能够生长和控制杂质掺杂的 ⟨100⟩纳米线对于集成至关重要。在这里,我们讨论了单晶 ⟨100⟩纳米线的掺杂,以及基于 ⟨100⟩InP 纳米线的 p-n 结的结构和光电性能。我们描述了一种通过基于 p 掺杂 InAsP 的渐变界面实现纳米线低电阻电接触的新方法。作为光电设备的首次演示,我们在 ⟨100⟩取向 InP 纳米线 p-n 结中实现了单个纳米线发光二极管。为了获得未来应用所需的高垂直产率,我们研究了掺杂剂的引入对纳米线生长的影响。

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