NTT Basic Research Laboratories, NTT Corporation , 3-1 Morinosato- Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
Nano Lett. 2012 Jun 13;12(6):2888-93. doi: 10.1021/nl300482n. Epub 2012 May 22.
We investigated the Au-assisted growth of alternating InAsP/InP heterostructures in wurtzite InP nanowires on InP(111)B substrates for constructing multiple-quantum-dot structures. Vertical InP nanowires without stacking faults were obtained at a high PH(3)/TMIn mole flow ratio of 300-1000. We found that the growth rate changed largely when approximately 40 min passed. Ten InAsP layers were inserted in the InP nanowire, and it was found that both the InP growth rate and the background As level increased after the As supply. We also grew the same structure using TBAs/TBP and could reduce the As level in the InP segments. A simulation using a finite-difference time-domain method suggests that the nanowire growth was dominated by the diffusion of the reaction species with long residence time on the surface. For TBAs/TBP, when the source gases were changed, the formed surface species showed a short diffusion length so as to reduce the As background after the InAsP growth.
我们研究了在 InP(111)B 衬底上的 wurtzite InP 纳米线上通过 Au 辅助生长交替的 InAsP/InP 异质结构,以构建多量子点结构。在 PH(3)/TMIn 摩尔流量比为 300-1000 的情况下,获得了没有位错的垂直 InP 纳米线。我们发现,当大约 40 分钟过去时,生长速率发生了很大变化。在 InP 纳米线中插入了 10 个 InAsP 层,发现在 As 供应之后,InP 的生长速率和背景 As 水平都增加了。我们还使用 TBAs/TBP 生长了相同的结构,并可以降低 InP 段中的 As 水平。使用时域有限差分法的模拟表明,纳米线的生长主要由表面上具有长停留时间的反应物种的扩散控制。对于 TBAs/TBP,当源气体发生变化时,形成的表面物种表现出短的扩散长度,从而在 InAsP 生长后降低背景 As。