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Intermediate (6-4) photoproduct repair in Chinese hamster V79 mutant V-H1 correlates with intermediate levels of DNA incision and repair replication.

作者信息

Mitchell D L, Zdzienicka M Z, van Zeeland A A, Nairn R S

机构信息

University of Texas M.D. Anderson Cancer Center, Science Park-Research Division, Smithville 78957.

出版信息

Mutat Res. 1989 May;226(1):43-7. doi: 10.1016/0165-7992(89)90091-2.

Abstract

A DNA-repair mutant isolated from Chinese hamster V79 cells, V-H1, has been characterized as having only slightly reduced unscheduled DNA synthesis (UDS) and intermediate levels of DNA incision and repair replication after UV exposure. This observation was unexpected, since V-H1 has been shown by genetic complementation analysis to belong to the UV5 complementation class (i.e., class 2), exhibiting equivalent UV hypersensitivity and hypermutability as UV5 cells, which are defective in incision, UDS and repair replication. We have examined the repair of cyclobutane dimers and (6-4) photoproducts in V-H1 and V79 cells and shown that V-H1 cells are deficient in cyclobutane dimer repair, but exhibit intermediate (6-4) photoproduct repair, unlike UV5 cells which are completely deficient in (6-4) photoproduct repair. Our results confirm observations made in other UV-hypersensitive Chinese hamster cell mutants in CHO complementation class 2, and suggest that the gene affected in these mutants (ERCC2) may be involved in at least two distinct repair pathways in hamster cells.

摘要

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