Kamminga J-D, Seijbel L J
Netherlands Institute for Metals Research, Rotterdamseweg 137, NL-2628 AL Delft, The Netherlands.
Bruker Nonius BV, Oostsingel 209, NL-2612 HL Delft, The Netherlands.
J Res Natl Inst Stand Technol. 2004 Feb 1;109(1):65-74. doi: 10.6028/jres.109.005. Print 2004 Jan-Feb.
The determination of dislocation distribution parameters is discussed for specimens where both strain broadening caused by dislocations and size broadening occur. If the strain broadening is well described by a model due to Wilkens, several methods are possible for the analysis of the broadening of diffraction lines. In sputter deposited nickel layers, three different methods for diffraction line broadening analysis yield identical results. The recrystallization of the nickel layers was investigated by annealing the layers at various temperatures in the range 300 K to 500 K. With increasing annealing temperature, the microstructure of the layers changed from a microstructure with small grains and high dislocation density, via a microstructure that is a mixture of small grains with high dislocation density and large grains with low dislocation density, to a microstructure with large grains and low dislocation density.
对于同时存在位错引起的应变展宽和尺寸展宽的试样，讨论了位错分布参数的测定。如果应变展宽可以用威尔肯斯提出的模型很好地描述，那么对于衍射线展宽的分析有几种可能的方法。在溅射沉积的镍层中，三种不同的衍射线展宽分析方法得出了相同的结果。通过在300K至500K范围内的不同温度下对镍层进行退火，研究了镍层的再结晶过程。随着退火温度的升高，镍层的微观结构从具有小晶粒和高位错密度的微观结构，经过由小晶粒和高位错密度以及大晶粒和低位错密度混合而成的微观结构，转变为具有大晶粒和低位错密度的微观结构。
