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硫化锌壳层对利用嵌入聚甲基丙烯酸甲酯层中的硒化镉/硫化镉/硫化锌核壳壳量子点制备的有机双稳器件电学性能的影响。

Effect of the ZnS Shell Layer on the Electrical Properties of Organic Bistable Devices Fabricated Utilizing CdSe/CdS/ZnS Core-Shell-Shell Quantum Dots Embedded in a Poly(methylmethacrylate) Layer.

作者信息

Lee Nam Hyun, Yun Dong Yeol, Choi Dong Hyuk, Kim Sang Wook, Kim Tae Whan

出版信息

J Nanosci Nanotechnol. 2016 Jun;16(6):6271-4. doi: 10.1166/jnn.2016.12105.

DOI:10.1166/jnn.2016.12105
PMID:27427701
Abstract

X-ray photoelectron spectroscopy spectra showed that the synthesized elements of the CdSe/CdS/ ZnS QDs were Cd, Se, Zn, and S. Organic bistable devices (OBDs) containing CdSe/CdS/ZnS quantum dots (QDs) and a poly(methylmethacrylate) (PMMA) layer were fabricated on indium-tin-oxide (ITO)-deposited glass substrates. Current-voltage (I-V) curves showed that the memory margin of the Al/(CdSe/CdS/ZnS QDs) embedded in PMMA layer/ITO device at 300 K was larger than that of the device without a ZnS shell layer. The retention time of the OBDs was above 1 x 10(4) s, indicative of the stability of the device. The memory mechanisms were described by using charge trapping and tunneling processes on the basis of the energy diagram and the I-V curves.

摘要

X射线光电子能谱表明,合成的CdSe/CdS/ZnS量子点的元素为Cd、Se、Zn和S。在沉积有氧化铟锡(ITO)的玻璃基板上制备了包含CdSe/CdS/ZnS量子点(QDs)和聚甲基丙烯酸甲酯(PMMA)层的有机双稳态器件(OBDs)。电流-电压(I-V)曲线表明,在300 K时,嵌入PMMA层/ITO器件中的Al/(CdSe/CdS/ZnS QDs)的记忆裕度大于没有ZnS壳层的器件。OBDs的保持时间超过1×10(4) s,表明该器件具有稳定性。基于能量图和I-V曲线,通过电荷俘获和隧穿过程描述了记忆机制。

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