Bishal Arghya K, Butt Arman, Selvaraj Sathees K, Joshi Bela, Patel Sweetu B, Huang Su, Yang Bin, Shukohfar Tolou, Sukotjo Cortino, Takoudis Christos G
Department of Bioengineering, University of Illinois at Chicago, Chicago, IL.
Department of Chemical Engineering, University of Illinois at Chicago, Chicago, IL.
Crit Rev Biomed Eng. 2015;43(4):255-76. doi: 10.1615/CritRevBiomedEng.2016016456.
Atomic layer deposition (ALD) is a technique increasingly used in nanotechnology and ultrathin film deposition; it is ideal for films in the nanometer and Angstrom length scales. ALD can effectively be used to modify the surface chemistry and functionalization of engineering-related and biologically important surfaces. It can also be used to alter the mechanical, electrical, chemical, and other properties of materials that are increasingly used in biomedical engineering and biological sciences. ALD is a relatively new technique for optimizing materials for use in bio-nanotechnology. Here, after a brief review of the more widely used modes of ALD and a few of its applications in biotechnology, selected results that show the potential of ALD in bio-nanotechnology are presented. ALD seems to be a promising means for tuning the hydrophilicity/hydrophobicity characteristics of biomedical surfaces, forming conformal ultrathin coatings with desirable properties on biomedical substrates with a high aspect ratio, tuning the antibacterial properties of substrate surfaces of interest, and yielding multifunctional biomaterials for medical implants and other devices.
原子层沉积（ALD）是一种在纳米技术和超薄薄膜沉积中越来越常用的技术；它非常适合用于纳米和埃长度尺度的薄膜。ALD可有效地用于改变与工程相关及生物学上重要表面的表面化学和功能化。它还可用于改变在生物医学工程和生物科学中越来越常用的材料的机械、电学、化学及其他性能。ALD是一种相对较新的用于优化生物纳米技术中所用材料的技术。在此，在简要回顾了更广泛使用的ALD模式及其在生物技术中的一些应用之后，展示了ALD在生物纳米技术中的潜力的选定结果被呈现出来。ALD似乎是一种很有前景的手段，可用于调节生物医学表面的亲水性/疏水性特征，在具有高纵横比的生物医学基材上形成具有理想性能的保形超薄涂层，调节感兴趣的基材表面的抗菌性能，以及生产用于医疗植入物和其他设备的多功能生物材料。
