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酿酒酵母中YLR162W基因的破坏导致对有机溶剂的耐受性增加。

Disruption of YLR162W in Saccharomyces cerevisiae results in increased tolerance to organic solvents.

作者信息

Kim Hyun-Soo

机构信息

Department of Food Science and Technology, Jungwon University, 85, Munmu-ro, Goesan-eup, Goesan-gun, Chungbuk, 367-805, Republic of Korea.

出版信息

Biotechnol Lett. 2016 Nov;38(11):1955-1960. doi: 10.1007/s10529-016-2188-y. Epub 2016 Aug 3.

DOI:10.1007/s10529-016-2188-y
PMID:27488408
Abstract

OBJECTIVE

To identify a novel gene responsible for organic solvent-tolerance by screening a transposon-mediated deletion mutant library based on Saccharomyces cerevisiae L3262.

RESULTS

One strain tolerant of up to 0.5 % (v/v) n-hexane and cyclohexane was isolated. The determination of transposon insertion site identified one gene, YLR162W, and revealed disruption of the ORF of this gene, indicating that organic solvent tolerance can be conferred. Such a tolerant phenotype reverted to the sensitive phenotype on the autologous or overexpression of this gene. This transposon mutant grew faster than the control strain when cultured at 30 °C in YPD medium containing 0.5 % (v/v) n-hexane and cyclohexane respectively.

CONCLUSION

Disruption of YLR162W in S. cerevisiae results in increased tolerance to organic solvents.

摘要

目的

通过筛选基于酿酒酵母L3262的转座子介导的缺失突变体文库,鉴定一个负责有机溶剂耐受性的新基因。

结果

分离出一株对高达0.5%(v/v)正己烷和环己烷具有耐受性的菌株。转座子插入位点的测定鉴定出一个基因YLR162W,并揭示该基因的开放阅读框被破坏,表明可以赋予有机溶剂耐受性。当该基因自体表达或过表达时,这种耐受表型恢复为敏感表型。当分别在含有0.5%(v/v)正己烷和环己烷的YPD培养基中于30℃培养时,该转座子突变体比对照菌株生长得更快。

结论

酿酒酵母中YLR162W的破坏导致对有机溶剂的耐受性增加。

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