Institut de Ciència de Materials de Barcelona, ICMAB (CSIC) , Campus UAB, 08193 Bellaterra, Spain.
Instituto de Microelectrónica de Barcelona, IMB-CNM (CSIC) , Campus UAB, 08193 Bellaterra, Spain.
ACS Appl Mater Interfaces. 2016 Nov 16;8(45):31092-31099. doi: 10.1021/acsami.6b07347. Epub 2016 Nov 2.
Thin carbon films deposited on technologically relevant substrates, such as silicon wafers, can be easily implemented in miniaturized electrochemical devices and used for sensing applications. However, a major issue in most carbon films is the weak film/substrate adhesion that shortens the working device lifetime. This paper describes the facile preparation of robust thin carbon films on silicon substrates by one-pot sol-gel synthesis. The improved adherence of these carbon films is based on the incorporation of silica through the controlled synthesis of a resorcinol/formaldehyde gel modified with aminopropyltriethoxysilane. The films demonstrate excellent adhesion to the silicon substrate, good homogeneity, excellent electrical conductivity and superior electrochemical performance. Moreover, this approach opens the door to the fabrication of carbon thin-film electrodes by photolithographic techniques.
在技术相关衬底（如硅片）上沉积的薄膜碳，可以很容易地应用于微型电化学器件中，并用于传感应用。然而，大多数碳薄膜的一个主要问题是薄膜与衬底的结合力较弱，从而缩短了工作器件的寿命。本文描述了一种通过一步溶胶-凝胶合成法在硅衬底上制备坚固的薄膜碳的简便方法。通过控制合成含有氨丙基三乙氧基硅烷的间苯二酚/甲醛凝胶，将二氧化硅掺入其中，从而提高了这些碳薄膜的附着力。这些薄膜与硅衬底具有良好的附着力、良好的均一性、优异的导电性和卓越的电化学性能。此外，这种方法为通过光刻技术制备薄膜碳电极开辟了道路。
