含1,2,4-三唑-3-硫醇环系席夫碱的聚苯乙烯薄膜的光稳定性及性能
Photostability and Performance of Polystyrene Films Containing 1,2,4-Triazole-3-thiol Ring System Schiff Bases.
作者信息
Ali Gassan Q, El-Hiti Gamal A, Tomi Ivan Hameed R, Haddad Raghad, Al-Qaisi Alaa J, Yousif Emad
机构信息
Department of Chemistry, College of Science, University of Al-Mustansiriyah, Baghdad 10052, Iraq.
Cornea Research Chair, Department of Optometry, College of Applied Medical Sciences, King Saud University, P.O. Box 10219, Riyadh 11433, Saudi Arabia.
出版信息
Molecules. 2016 Dec 9;21(12):1699. doi: 10.3390/molecules21121699.
Series of 4-(4-substituted benzylideneamino)-5-(3,4,5-trimethoxyphenyl)-4-1,2,4-triazole-3-thiols were synthesized and their structures were confirmed. The synthesized Schiff bases were used as photostabilizers for polystyrene against photodegradation. Polystyrene polymeric films containing synthesized Schiff bases (0.5% by weight) were irradiated (λ = 365 nm and light intensity = 6.43 × 10 ein·dm·s) at room temperature. The photostabilization effect of 1,2,4-triazole-3-thiols Schiff bases was determined using various methods. All the additives used enhanced the photostability of polystyrene films against irradiation compared with the result obtained in the absence of Schiff base. The Schiff bases can act as photostabilizers for polystyrene through the direct absorption of UV radiation and/or radical scavengers.
合成了一系列4-(4-取代亚苄基氨基)-5-(3,4,5-三甲氧基苯基)-4H-1,2,4-三唑-3-硫醇，并对其结构进行了确证。合成的席夫碱用作聚苯乙烯的光稳定剂以防止光降解。在室温下，对含有合成席夫碱（重量比0.5%）的聚苯乙烯聚合物薄膜进行辐照（λ = 365 nm，光强 = 6.43×10 ein·dm·s）。使用各种方法测定了1,2,4-三唑-3-硫醇席夫碱的光稳定化效果。与未添加席夫碱时的结果相比，所有使用的添加剂均提高了聚苯乙烯薄膜对辐照的光稳定性。席夫碱可通过直接吸收紫外线辐射和/或作为自由基清除剂而用作聚苯乙烯的光稳定剂。
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