用于氧还原反应的低温氧化石墨烯氮掺杂

N-Doping of graphene oxide at low temperature for the oxygen reduction reaction.

作者信息

Tao Hengcong, Yan Chao, Robertson Alex W, Gao Yunnan, Ding Jingjing, Zhang Yuqin, Ma Tao, Sun Zhenyu

机构信息

State Key Laboratory of Organic-Inorganic Composites, Beijing University of Chemical Technology, Beijing 100029, China.

School of Material Science & Engineering, Jiangsu University of Science and Technology, Zhenjiang 212003, China.

出版信息

Chem Commun (Camb). 2017 Jan 10;53(5):873-876. doi: 10.1039/c6cc08776k.

DOI:10.1039/c6cc08776k

PMID:28000811

Abstract

Nitrogen doping of graphene oxide was demonstrated for the first time at a temperature as low as 5 °C in ammonia solution with the aid of ultrasonication. Controlling the ultrasonication time and bath temperature permitted tuning of the N doping level. The resulting N doped graphene oxide showed high activity towards the oxygen reduction reaction.

摘要

首次在5℃的低温下于氨溶液中借助超声处理实现了氧化石墨烯的氮掺杂。通过控制超声处理时间和水浴温度可以调节氮掺杂水平。所得的氮掺杂氧化石墨烯对氧还原反应表现出高活性。