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横向拓扑绝缘体异质结中的高效光热电转换。

Efficient Photothermoelectric Conversion in Lateral Topological Insulator Heterojunctions.

机构信息

Max Planck Institute for Solid State Research , Heisenbergstrasse 1, D-70569 Stuttgart, Germany.

Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS) , Suwon 16419, Republic of Korea.

出版信息

Nano Lett. 2017 Jan 11;17(1):214-219. doi: 10.1021/acs.nanolett.6b03851. Epub 2016 Dec 8.

DOI:10.1021/acs.nanolett.6b03851
PMID:28073269
Abstract

Tuning the electron and phonon transport properties of thermoelectric materials by nanostructuring has enabled improving their thermopower figure of merit. Three-dimensional topological insulators, including many bismuth chalcogenides, attract increasing attention for this purpose, as their topologically protected surface states are promising to further enhance the thermoelectric performance. While individual bismuth chalcogenide nanostructures have been studied with respect to their photothermoelectric properties, nanostructured p-n junctions of these compounds have not yet been explored. Here, we experimentally investigate the room temperature thermoelectric conversion capability of lateral heterostructures consisting of two different three-dimensional topological insulators, namely, the n-type doped BiTeSe and the p-type doped SbTe. Scanning photocurrent microscopy of the nanoplatelets reveals efficient thermoelectric conversion at the p-n heterojunction, exploiting hot carriers of opposite sign in the two materials. From the photocurrent data, a Seebeck coefficient difference of ΔS = 200 μV/K was extracted, in accordance with the best values reported for the corresponding bulk materials. Furthermore, it is in very good agreement with the value of ΔS = 185 μV/K obtained by DFT calculation taking into account the specific doping levels of the two nanostructured components.

摘要

通过纳米结构来调整热电材料的电子和声子输运性质,可以提高其热电优值。三维拓扑绝缘体,包括许多铋硫属化物,由于其拓扑保护的表面态有望进一步提高热电性能,因此引起了越来越多的关注。虽然已经研究了单个铋硫属化物纳米结构的光热电性质,但这些化合物的纳米结构 p-n 结尚未得到探索。在这里,我们通过实验研究了由两种不同的三维拓扑绝缘体(即 n 型掺杂的 BiTeSe 和 p 型掺杂的 SbTe)组成的横向异质结构的室温热电转换能力。纳米板的扫描光电流显微镜揭示了在 p-n 异质结处的高效热电转换,利用了两种材料中相反符号的热载流子。从光电流数据中,提取出 Seebeck 系数差 ΔS = 200 μV/K,与相应体材料报告的最佳值一致。此外,考虑到两个纳米结构组件的特定掺杂水平,通过 DFT 计算得到的 ΔS = 185 μV/K 值与该值非常吻合。

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