Dufour C, Khomrenkov V, Wang Y Y, Wang Z G, Aumayr F, Toulemonde M
CIMAP (CEA-CNRS-ENSICAEN-Université de Caen Basse Normandie), BP5133, 14070 Caen Cedex 5, France.
J Phys Condens Matter. 2017 Mar 8;29(9):095001. doi: 10.1088/1361-648X/aa547a. Epub 2017 Jan 27.
Surface damage appears on materials irradiated by highly charged ions (HCI). Since a direct link has been found between surface damage created by HCI with the one created by swift heavy ions (SHI), the inelastic thermal spike model (i-TS model) developed to explain track creation resulting from the electron excitation induced by SHI can also be applied to describe the response of materials under HCI which transfers its potential energy to electrons of the target. An experimental description of the appearance of the hillock-like nanoscale protrusions induced by SHI at the surface of CaF is presented in comparison with track formation in bulk which shows that the only parameter on which we can be confident is the electronic energy loss threshold. Track size and electronic energy loss threshold resulting from SHI irradiation of CaF is described by the i-TS model in a 2D geometry. Based on this description the i-TS model is extended to three dimensions to describe the potential threshold of appearance of protrusions by HCI in CaF and to other crystalline materials (LiF, crystalline SiO, mica, LiNbO, SrTiO, ZnO, TiO, HOPG). The strength of the electron-phonon coupling and the depth in which the potential energy is deposited near the surface combined with the energy necessary to melt the material defines the classification of the material sensitivity. As done for SHI, the band gap of the material may play an important role in the determination of the depth in which the potential energy is deposited. Moreover larger is the initial potential energy and larger is the depth in which it is deposited.
在受到高电荷离子(HCI)辐照的材料上会出现表面损伤。由于已发现HCI产生的表面损伤与快重离子(SHI)产生的表面损伤之间存在直接联系,因此为解释SHI诱导的电子激发所导致的径迹形成而开发的非弹性热尖峰模型(i-TS模型),也可用于描述材料在HCI作用下的响应,HCI会将其势能传递给靶材的电子。本文给出了关于SHI在CaF表面诱导产生的丘状纳米级突起外观的实验描述,并与体材料中的径迹形成进行了比较,结果表明我们唯一能确定的参数是电子能量损失阈值。i-TS模型在二维几何结构中描述了SHI辐照CaF产生的径迹尺寸和电子能量损失阈值。基于这一描述,i-TS模型扩展到三维,以描述HCI在CaF及其他晶体材料(LiF、晶体SiO、云母、LiNbO、SrTiO、ZnO、TiO、HOPG)中产生突起的潜在阈值。电子-声子耦合强度、表面附近势能沉积的深度以及熔化材料所需的能量共同定义了材料敏感性的分类。与SHI的情况一样,材料的带隙可能在确定势能沉积深度方面起重要作用。此外,初始势能越大,其沉积深度就越大。