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离子显微镜中氦离子和氖离子深度剖析能力的数值研究。

Numerical investigation of depth profiling capabilities of helium and neon ions in ion microscopy.

作者信息

Philipp Patrick, Rzeznik Lukasz, Wirtz Tom

机构信息

Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg.

出版信息

Beilstein J Nanotechnol. 2016 Nov 17;7:1749-1760. doi: 10.3762/bjnano.7.168. eCollection 2016.

Abstract

The analysis of polymers by secondary ion mass spectrometry (SIMS) has been a topic of interest for many years. In recent years, the primary ion species evolved from heavy monatomic ions to cluster and massive cluster primary ions in order to preserve a maximum of organic information. The progress in less-damaging sputtering goes along with a loss in lateral resolution for 2D and 3D imaging. By contrast the development of a mass spectrometer as an add-on tool for the helium ion microscope (HIM), which uses finely focussed He or Ne beams, allows for the analysis of secondary ions and small secondary cluster ions with unprecedented lateral resolution. Irradiation induced damage and depth profiling capabilities obtained with these light rare gas species have been far less investigated than ion species used classically in SIMS. In this paper we simulated the sputtering of multi-layered polymer samples using the BCA (binary collision approximation) code SD_TRIM_SP to study preferential sputtering and atomic mixing in such samples up to a fluence of 10 ions/cm. Results show that helium primary ions are completely inappropriate for depth profiling applications with this kind of sample materials while results for neon are similar to argon. The latter is commonly used as primary ion species in SIMS. For the two heavier species, layers separated by 10 nm can be distinguished for impact energies of a few keV. These results are encouraging for 3D imaging applications where lateral and depth information are of importance.

摘要

多年来,通过二次离子质谱法(SIMS)对聚合物进行分析一直是一个备受关注的课题。近年来,为了最大程度地保留有机信息,初级离子种类已从重单原子离子演变为团簇和大质量团簇初级离子。在减少损伤的溅射方面取得的进展伴随着二维和三维成像横向分辨率的降低。相比之下,作为氦离子显微镜(HIM)附加工具的质谱仪的发展,HIM使用精细聚焦的氦或氖束,使得能够以前所未有的横向分辨率分析二次离子和小的二次团簇离子。与SIMS中传统使用的离子种类相比,这些轻稀有气体种类所产生的辐照诱导损伤和深度剖析能力的研究要少得多。在本文中,我们使用二元碰撞近似(BCA)代码SD_TRIM_SP模拟了多层聚合物样品的溅射过程,以研究此类样品中高达10离子/cm注量时的择优溅射和原子混合。结果表明,氦初级离子完全不适用于此类样品材料的深度剖析应用,而氖的结果与氩相似。氩是SIMS中常用的初级离子种类。对于这两种较重的离子种类,对于几keV的撞击能量,可以区分间隔10nm的层。这些结果对于横向和深度信息都很重要的三维成像应用来说是令人鼓舞的。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b9e3/5238654/bdd4c16e0265/Beilstein_J_Nanotechnol-07-1749-g002.jpg

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