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聚合物及相关材料的团簇二次离子质谱分析。

Cluster secondary ion mass spectrometry of polymers and related materials.

机构信息

Chemical Science and Technology Laboratory, Surface and Microanalysis Science Division, National Institute of Standards and Technology, 100 Bureau Drive, Mail Stop 8371, Gaithersburg, MD 20899-8371, USA.

出版信息

Mass Spectrom Rev. 2010 Mar-Apr;29(2):247-93. doi: 10.1002/mas.20233.

DOI:10.1002/mas.20233
PMID:19449334
Abstract

Cluster secondary ion mass spectrometry (cluster SIMS) has played a critical role in the characterization of polymeric materials over the last decade, allowing for the ability to obtain spatially resolved surface and in-depth molecular information from many polymer systems. With the advent of new molecular sources such as C(60)(+), Au(3)(+), SF(5)(+), and Bi(3)(+), there are considerable increases in secondary ion signal as compared to more conventional atomic beams (Ar(+), Cs(+), or Ga(+)). In addition, compositional depth profiling in organic and polymeric systems is now feasible, without the rapid signal decay that is typically observed under atomic bombardment. The premise behind the success of cluster SIMS is that compared to atomic beams, polyatomic beams tend to cause surface-localized damage with rapid sputter removal rates, resulting in a system at equilibrium, where the damage created is rapidly removed before it can accumulate. Though this may be partly true, there are actually much more complex chemistries occurring under polyatomic bombardment of organic and polymeric materials, which need to be considered and discussed to better understand and define the important parameters for successful depth profiling. The following presents a review of the current literature on polymer analysis using cluster beams. This review will focus on the surface and in-depth characterization of polymer samples with cluster sources, but will also discuss the characterization of other relevant organic materials, and basic polymer radiation chemistry.

摘要

团簇二次离子质谱(cluster SIMS)在过去十年中在聚合物材料的特性分析中发挥了关键作用,使我们能够从许多聚合物系统中获得空间分辨的表面和深度分子信息。随着新型分子源(如 C(60)(+)、Au(3)(+)、SF(5)(+)和 Bi(3)(+))的出现,与更传统的原子束(Ar(+)、Cs(+)或 Ga(+))相比,二次离子信号有了相当大的提高。此外,现在可以对有机和聚合物系统进行组成深度剖析,而不会像原子轰击那样出现信号迅速衰减的情况。团簇 SIMS 成功的前提是,与原子束相比,多原子束倾向于以快速的溅射去除速率引起表面局部损伤,从而使系统达到平衡,在损伤累积之前迅速去除所造成的损伤。虽然这在一定程度上是正确的,但实际上在有机和聚合物材料的多原子轰击下会发生更为复杂的化学反应,需要对其进行考虑和讨论,以便更好地理解和定义成功深度剖析的重要参数。以下是使用团簇束进行聚合物分析的当前文献综述。本综述将重点介绍使用团簇源对聚合物样品的表面和深度特性进行分析,但也将讨论其他相关有机材料的特性分析以及基本的聚合物辐射化学。

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