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用于集成高Q值微谐振器的蓝宝石基氮化铝平台。

Aluminum nitride-on-sapphire platform for integrated high-Q microresonators.

作者信息

Liu Xianwen, Sun Changzheng, Xiong Bing, Wang Lai, Wang Jian, Han Yanjun, Hao Zhibiao, Li Hongtao, Luo Yi, Yan Jianchang, Wei Tongbo, Zhang Yun, Wang Junxi

出版信息

Opt Express. 2017 Jan 23;25(2):587-594. doi: 10.1364/OE.25.000587.

Abstract

We demonstrate aluminum nitride (AlN) on sapphire as a novel platform for integrated optics. High-confinement AlN microring resonators are realized by adopting a partially etched (pedestal) waveguide to relax the required etching selectivity for exact pattern transfer. A wide taper is employed at the chip end facets to ensure a low fiber-to-chip coupling loss of ~2.8 dB/facet for both transverse-electric (TE) and transverse-magnetic (TM) modes. Furthermore, the intrinsic quality factors (Q) recorded with a high-resolution linewidth measurement are up to ~2.5 and 1.9 million at telecom band for fundamental TE and TM modes, corresponding to a low intracavity propagation loss of ~0.14 and 0.2 dB/cm as well as high resonant buildup of 473 and 327, respectively. Such high-Q AlN-on-sapphire microresonators are believed to be very promising for on-chip nonlinear optics.

摘要

我们展示了蓝宝石上的氮化铝(AlN)作为集成光学的新型平台。通过采用部分蚀刻(基座)波导来放宽精确图案转移所需的蚀刻选择性,实现了高限制的AlN微环谐振器。在芯片端面采用宽锥形,以确保横向电(TE)和横向磁(TM)模式的光纤到芯片耦合损耗低至约2.8 dB/面。此外,通过高分辨率线宽测量记录的本征品质因数(Q)在电信频段,对于基模TE和TM模式分别高达约250万和190万,对应腔内传播损耗低至约0.14和0.2 dB/cm,以及分别高达473和327的高谐振增强。这种高Q值的蓝宝石上的AlN微谐振器被认为在片上非线性光学方面非常有前景。

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