Tang Chien-Jen, Jaing Cheng-Chung, Tien Chuen-Lin, Sun Wei-Chiang, Lin Shih-Chin
Appl Opt. 2017 Feb 1;56(4):C168-C174. doi: 10.1364/AO.56.00C168.
Silicon oxynitride films were deposited by reactive pulsed magnetron sputtering. The optical, structural, and mechanical properties of silicon oxynitride films with different nitrogen proportions were analyzed via spectroscopy, atomic force microscopy, Twyman-Green interferometer, and nanoindentation. The refractive indices of the silicon oxynitride films were adjusted from 1.487 to 1.956 with the increase in nitrogen proportions. The surface roughness decreased from 1.33 to 0.97 nm with the increase in nitrogen proportions. The residual stress of the silicon oxynitride films was higher than for pure silicon nitride and silicon dioxide films. The hardness and Young's modulus increased from 13.51 to 19.74 GPa and 110.41 to 140.49 GPa with the increase in nitrogen proportions, respectively. The hardness and Young's modulus of antireflection coatings using silicon oxynitride film were 13.64 GPa and 102.11 GPa, respectively. Silicon oxynitride film could be used to improve the hardness of antireflective coatings.
通过反应脉冲磁控溅射沉积氮氧化硅薄膜。利用光谱学、原子力显微镜、泰曼-格林干涉仪和纳米压痕法分析了不同氮比例的氮氧化硅薄膜的光学、结构和力学性能。随着氮比例的增加，氮氧化硅薄膜的折射率从1.487调整到1.956。随着氮比例的增加，表面粗糙度从1.33纳米降至0.97纳米。氮氧化硅薄膜的残余应力高于纯氮化硅薄膜和二氧化硅薄膜。随着氮比例的增加，硬度和杨氏模量分别从13.51吉帕增加到19.74吉帕，从110.41吉帕增加到140.49吉帕。使用氮氧化硅薄膜的减反射涂层的硬度和杨氏模量分别为13.64吉帕和102.11吉帕。氮氧化硅薄膜可用于提高减反射涂层的硬度。
