Chun Sung-Yong
Department of Advanced Materials Engineering, Mokpo National University, Muan, Jeonnam 58554, Republic of Korea.
J Nanosci Nanotechnol. 2021 Jul 1;21(7):4125-4128. doi: 10.1166/jnn.2021.19200.
Nanocrystalline HfN thin films were deposited onto silicon substrates with direct current magnetron sputtering (dcMS) and mid-frequency magnetron sputtering (mfMS) by using hafnium metallic target with 3-inch diameter and 99.9% purity in argon/nitrogen atmosphere, under 4 different pulse frequencies and duty cycles. In order to evaluate the structural, morphological and mechanical properties, we used X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), nanoindentation tests. X-ray diffraction patterns show that films sputtered in dcMS mode have a mixed -HfN and HfN phases, whereas mfMS favor a single -HfN phase. mfMS leads to films with the higher mechanical hardness and smaller surface roughness than those of films deposited by dcMS. Hafnium nitride films with a single -HfN phase show the highest hardness values of 24.5 GPa while those of mixed -HfN and HfN phases show the lowest 18.3 GPa. In summary, the sputtering technique has a crucial role on the properties of the film and can be suitable used to adjust the structure and hardness of HfN films.
在氩气/氮气气氛中，使用直径3英寸、纯度99.9%的铪金属靶材，通过直流磁控溅射（dcMS）和中频磁控溅射（mfMS），在4种不同的脉冲频率和占空比条件下，将纳米晶HfN薄膜沉积到硅衬底上。为了评估其结构、形态和力学性能，我们使用了X射线衍射（XRD）、场发射扫描电子显微镜（FE-SEM）、原子力显微镜（AFM）和纳米压痕测试。X射线衍射图谱表明，以dcMS模式溅射的薄膜具有混合的-HfN和HfN相，而mfMS有利于形成单一的-HfN相。与通过dcMS沉积的薄膜相比，mfMS导致薄膜具有更高的机械硬度和更小的表面粗糙度。具有单一-HfN相的氮化铪薄膜显示出最高硬度值为24.5 GPa，而混合-HfN和HfN相的薄膜显示出最低硬度值为18.3 GPa。总之，溅射技术对薄膜的性能起着至关重要的作用，并且可适用于调整HfN薄膜的结构和硬度。
