Demushkin V P, Fomenko A M, Plyashkevich Y G, Shchurin M R, Brusov O S
Laboratory of Neurochemistry, All-Union Research Center for Mental Health of Acad. Med. Sci. U.S.S.R., Moscow.
Eur J Pharmacol. 1987 Aug 11;140(2):171-8. doi: 10.1016/0014-2999(87)90802-8.
We have confirmed the presence of two different classes of [3H]imipramine ([3H]IMI) binding sites on human platelets: high-affinity (Kd = 0.52 nM, Bmax = 1670 fmol/mg protein) and low-affinity (Kd = 101 nM, Bmax = 8,000 fmol/mg protein) binding sites. The high-affinity component of [3H]IMI binding can also be obtained separately as the difference between specific [3H]IMI binding in Na-containing and Li-containing incubation buffer. The low-affinity component can be obtained as the difference between [3H]IMI binding in 50 mM Tris-HCl, 5 mM KCl, 120 mM LiCl, (pH 7.5) in the absence and presence of 0.1 mM IMI. The chemical modification of SH groups was performed with Ellman's reagent (10 mM, 40 min at 23 degrees C). The high-affinity component of the binding was totally inhibited while the low-affinity component only decreased by 39%. No decrease in [3H]IMI specific binding was observed when the modification of SH groups was carried out in the presence of 1 microM IMI. The inhibition of high- and low-affinity [3H]IMI binding was reversible since it was completely restored by incubation of modified membranes with 1,4-dithioerythritol (DTE). The reduction of SS groups by DTE (10 mM, 1 h at 23 degrees C) in the intact membrane preparation produced an increase in total number of binding sites of the high-affinity component of [3H]IMI binding by 50%.
我们已经证实人血小板上存在两类不同的[³H]丙咪嗪([³H]IMI)结合位点:高亲和力(Kd = 0.52 nM,Bmax = 1670 fmol/mg蛋白质)和低亲和力(Kd = 101 nM,Bmax = 8000 fmol/mg蛋白质)结合位点。[³H]IMI结合的高亲和力成分也可以通过含钠和含锂孵育缓冲液中特异性[³H]IMI结合的差异单独获得。低亲和力成分可以通过在不存在和存在0.1 mM IMI的情况下,在50 mM Tris-HCl、5 mM KCl、120 mM LiCl(pH 7.5)中[³H]IMI结合的差异获得。使用埃尔曼试剂(10 mM,23℃下40分钟)对巯基进行化学修饰。结合的高亲和力成分被完全抑制,而低亲和力成分仅下降39%。当在1 μM IMI存在下进行巯基修饰时,未观察到[³H]IMI特异性结合的下降。高亲和力和低亲和力[³H]IMI结合的抑制是可逆的,因为用1,4-二硫苏糖醇(DTE)孵育修饰后的膜可使其完全恢复。在完整膜制剂中,DTE(10 mM,23℃下1小时)对二硫键的还原使[³H]IMI结合高亲和力成分的结合位点总数增加了50%。