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卤化物混合对有机-无机杂化钙钛矿存储器开关行为的影响。

Effect of halide-mixing on the switching behaviors of organic-inorganic hybrid perovskite memory.

机构信息

Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea.

School of Materials Science and Engineering, Chonnam National University, 77 Yongbongro, Buk-gu, Gwangju, 500-757, Korea.

出版信息

Sci Rep. 2017 Mar 8;7:43794. doi: 10.1038/srep43794.

Abstract

Mixed halide perovskite materials are actively researched for solar cells with high efficiency. Their hysteresis which originates from the movement of defects make perovskite a candidate for resistive switching memory devices. We demonstrate the resistive switching device based on mixed-halide organic-inorganic hybrid perovskite CHNHPbIBr (x = 0, 1, 2, 3). Solvent engineering is used to deposit the homogeneous CHNHPbIBr layer on the indium-tin oxide-coated glass substrates. The memory device based on CHNHPbIBr exhibits write endurance and long retention, which indicate reproducible and reliable memory properties. According to the increase in Br contents in CHNHPbIBr the set electric field required to make the device from low resistance state to high resistance state decreases. This result is in accord with the theoretical calculation of migration barriers, that is the barrier to ionic migration in perovskites is found to be lower for Br (0.23 eV) than for I (0.29-0.30 eV). The resistive switching may be the result of halide vacancy defects and formation of conductive filaments under electric field in the mixed perovskite layer. It is observed that enhancement in operating voltage can be achieved by controlling the halide contents in the film.

摘要

混合卤化物钙钛矿材料因其高效率被积极应用于太阳能电池研究。钙钛矿中的迟滞现象源于缺陷的运动,这使其成为阻变存储器件的候选材料。我们展示了基于混合卤化物有机-无机杂化钙钛矿 CHNHPbIBr(x=0、1、2、3)的阻变器件。我们采用溶剂工程在氧化铟锡涂覆的玻璃基底上沉积均匀的 CHNHPbIBr 层。基于 CHNHPbIBr 的忆阻器件表现出良好的写入耐久性和长期保持性,这表明其具有可重复且可靠的存储性能。随着 CHNHPbIBr 中 Br 含量的增加,使器件从低阻状态变为高阻状态所需的设定电场减小。这一结果与迁移势垒的理论计算相符,即钙钛矿中离子迁移的势垒对于 Br(0.23eV)比对于 I(0.29-0.30eV)更低。阻变可能是混合钙钛矿层中卤化物空位缺陷和电场下形成的导电细丝导致的。我们观察到,通过控制薄膜中的卤化物含量,可以提高工作电压。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/adfd/5341555/e64d5c1983df/srep43794-f1.jpg

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