Center for Reliability Sciences &Technologies, Chang Gung University, 259, Wen-Hwa 1st Road, Kwei-Shan, Taoyuan, 33302, ROC Taiwan.
Department of Electronic Engineering, Chang Gung University, 259, Wen-Hwa 1st Road, Kwei-Shan, Taoyuan, 33302, ROC Taiwan.
Sci Rep. 2017 Mar 9;7:44112. doi: 10.1038/srep44112.
Growth mechanism for synthesizing PVD based Graphene using Amorphous Carbon, catalyzed by Copper is investigated in this work. Different experiments with respect to Amorphous Carbon film thickness, annealing time and temperature are performed for the investigation. Copper film stress and its effect on hydrogen diffusion through the film grain boundaries are found to be the key factors for the growth mechanism, and supported by our Finite Element Modeling. Low temperature growth of Graphene is achieved and the proposed growth mechanism is found to remain valid at low temperatures.
本工作研究了使用非晶态碳作为碳源,铜作为催化剂,合成 PVD 基石墨烯的生长机制。针对非晶态碳薄膜厚度、退火时间和温度等方面进行了不同的实验研究。研究发现,铜膜应力及其对氢通过膜晶界扩散的影响是生长机制的关键因素,并得到了我们的有限元建模的支持。实现了石墨烯的低温生长,并发现所提出的生长机制在低温下仍然有效。