Area-Selective Atomic Layer Deposition of InO:H Using a μ-Plasma Printer for Local Area Activation.
作者信息
Mameli Alfredo, Kuang Yinghuan, Aghaee Morteza, Ande Chaitanya K, Karasulu Bora, Creatore Mariadriana, Mackus Adriaan J M, Kessels Wilhelmus M M, Roozeboom Fred
机构信息
Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven, The Netherlands; Department Thin Film Technology, TNO, High Tech Campus 21, 5656 AE Eindhoven, The Netherlands.
出版信息
Chem Mater. 2017 Feb 14;29(3):921-925. doi: 10.1021/acs.chemmater.6b04469. Epub 2017 Jan 23.
Abstract
摘要
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