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揭示 GaAs 纳米膜的大规模均匀性和痕量杂质敏感性。

Revealing Large-Scale Homogeneity and Trace Impurity Sensitivity of GaAs Nanoscale Membranes.

机构信息

Laboratoire National des Champs Magnétiques Intenses , CNRS-UGA-UPS-INSA, 143 avenue de Rangueil, 31400 Toulouse, France.

Laboratory of Semiconductor Material, École Polytechnique Fédérale de Lausanne , 1015 Lausanne, Switzerland.

出版信息

Nano Lett. 2017 May 10;17(5):2979-2984. doi: 10.1021/acs.nanolett.7b00257. Epub 2017 Apr 27.

Abstract

III-V nanostructures have the potential to revolutionize optoelectronics and energy harvesting. For this to become a reality, critical issues such as reproducibility and sensitivity to defects should be resolved. By discussing the optical properties of molecular beam epitaxy (MBE) grown GaAs nanomembranes we highlight several features that bring them closer to large scale applications. Uncapped membranes exhibit a very high optical quality, expressed by extremely narrow neutral exciton emission, allowing the resolution of the more complex excitonic structure for the first time. Capping of the membranes with an AlGaAs shell results in a strong increase of emission intensity but also in a shift and broadening of the exciton peak. This is attributed to the existence of impurities in the shell, beyond MBE-grade quality, showing the high sensitivity of these structures to the presence of impurities. Finally, emission properties are identical at the submicron and submillimeter scale, demonstrating the potential of these structures for large scale applications.

摘要

III-V 纳米结构有可能彻底改变光电和能量收集领域。为了实现这一目标,需要解决关键问题,如可重复性和对缺陷的敏感性。通过讨论分子束外延(MBE)生长的 GaAs 纳米膜的光学性质,我们强调了几个使其更接近大规模应用的特征。未覆盖的膜表现出非常高的光学质量,表现在非常窄的中性激子发射上,这使得第一次能够解析更复杂的激子结构。用 AlGaAs 壳覆盖膜会导致发射强度的大幅增加,但也会导致激子峰的移动和展宽。这归因于壳层中存在杂质,超出了 MBE 级别的质量,表明这些结构对杂质的存在非常敏感。最后,亚微米和亚毫米尺度的发射性质相同,这表明这些结构在大规模应用方面具有潜力。

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