Tutuncuoglu G, de la Mata M, Deiana D, Potts H, Matteini F, Arbiol J, Fontcuberta i Morral A
Laboratory of Semiconductor Materials, Ecole Polytechnique Fédérale de Lausanne, EPFL, 1015 Lausanne, Switzerland.
Nanoscale. 2015 Dec 14;7(46):19453-60. doi: 10.1039/c5nr04821d. Epub 2015 Sep 29.
We demonstrate the growth of defect-free zinc-blende GaAs nanomembranes by molecular beam epitaxy. Our growth studies indicate a strong impact of As4 re-emission and shadowing in the growth rate of the structures. The highest aspect ratio structures are obtained for pitches around 0.7-1 μm and a gallium rate of 1 Å s(-1). The functionality of the membranes is further illustrated by the growth of quantum heterostructures (such as quantum wells) and the characterization of their optical properties at the nanoscale. This proves the potential of nanoscale membranes for optoelectronic applications.
我们通过分子束外延展示了无缺陷闪锌矿结构砷化镓纳米膜的生长。我们的生长研究表明,As4再发射和阴影效应在结构的生长速率中具有强烈影响。对于间距约为0.7 - 1μm且镓速率为1 Å s(-1) 的情况,可获得最高的纵横比结构。量子异质结构(如量子阱)的生长及其在纳米尺度上的光学性质表征进一步说明了这些膜的功能。这证明了纳米膜在光电子应用方面的潜力。