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金属衬底支撑的少层拓扑绝缘体的厚度相关狄拉克色散。

Thickness-dependent Dirac dispersions of few-layer topological insulators supported by metal substrate.

机构信息

Department of Physics, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul, 02841, Republic of Korea.

出版信息

Nanotechnology. 2017 May 26;28(21):215207. doi: 10.1088/1361-6528/aa6b52.

Abstract

The surface states protected by time-reversal symmetry in 3-dimensional topological insulators have recently been confirmed by angle-resolved photoemission spectroscopy, scanning tunneling microscopy, quantum transport and so on. However, the electronic properties of ultra-thin topological insulator films have not been extensively studied, especially when the films are grown on metal substrates. In this paper, we have elucidated the local behaviors of the electronic states of ultra-thin topological insulator BiSe grown with molecular beam epitaxy on Au(111) using scanning tunneling microscopy/spectroscopy. We have observed linear dispersion of electron interference patterns at higher energies than the Fermi energy that were not accessible by conventional angle-resolved photoemission spectroscopy. Moreover, the dispersion of the interference patterns varies with the film thickness, which is explained by band bending near the interface between the topological insulator and the metal substrate. Our experiments demonstrate that interfacial effects in thin topological insulator films on metal substrate can be sensed using scanning tunneling spectroscopy.

摘要

三维拓扑绝缘体中受时间反演对称性保护的表面态最近已通过角分辨光发射谱、扫描隧道显微镜、量子输运等手段得到证实。然而,超薄膜的拓扑绝缘体的电子性质尚未得到广泛研究,特别是当薄膜生长在金属衬底上时。在本文中,我们利用扫描隧道显微镜/光谱学研究了分子束外延在 Au(111)上生长的超薄 BiSe 拓扑绝缘体的电子态的局域行为。我们观察到了在费米能级以上的电子干涉图案的线性色散,这是传统角分辨光发射谱无法探测到的。此外,干涉图案的色散随薄膜厚度而变化,这可以通过拓扑绝缘体与金属衬底界面附近的能带弯曲来解释。我们的实验表明,金属衬底上的超薄拓扑绝缘体薄膜中的界面效应可以通过扫描隧道光谱来探测。

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