School of Physics and Electronics, Hunan Key Laboratory for Super-microstructure and Ultrafast Process, Central South University, Changsha, 932 South Lushan Road, Hunan 410083, People's Republic of China. Department of Materials Science and Engineering, University of California, Berkeley, California 94720, United States of America.
Nanotechnology. 2017 Jun 9;28(23):235303. doi: 10.1088/1361-6528/aa703e.
We report on the observation of an unexpected sudden increase of resistance in bilayer graphene nanomesh (GNM) in the temperature range 270 ∼ 300 K that is strongly dependent on the magnetic field strength. We conjecture that the sharp increase in resistance originates from ripple scattering as induced by substrate roughness. The observed result is evidence of extrinsic corrugation in bilayer GNM as an additional scattering source that contributes to significant resistance. The observed weak localization in the GNM indicates intervalley scattering induced by lattice defects acts as resonant scatterers attribute to the high D peak. Magnetotransport measurement strongly supports that the charge inhomogeneity related to the intrinsic disorder in bilayer GNM and the positive magnetoresistance shows a linear behavior with magnetic field strength. Potentially, the observed phenomena, therefore, point to a clear pathway towards practical application of bilayer GNM and to the design of a graphene magnetic sensor that can be manipulated by a magnetic field and a new generation of spintronics.
我们报告了在 270∼300 K 的温度范围内观察到双层石墨烯纳米网(GNM)中电阻的意外突然增加,这强烈依赖于磁场强度。我们推测,电阻的急剧增加源于基底粗糙度引起的波纹散射。观察到的结果表明,双层 GNM 中的外在波纹是作为附加散射源的另一个散射源,这导致了显著的电阻增加。在 GNM 中观察到的弱局域化表明,由晶格缺陷引起的谷间散射作为共振散射体起作用,这归因于高 D 峰。磁输运测量强烈支持与双层 GNM 中的本征无序相关的电荷不均匀性,并且正磁电阻与磁场强度呈线性关系。因此,观察到的现象可能指向双层 GNM 的实际应用以及设计可以通过磁场和新一代自旋电子学进行操作的石墨烯磁传感器的明确途径。