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SU-E-T-142:电子束条件下Gafchromic EBT3薄膜能量依赖性评估

SU-E-T-142: Evaluation of the Energy Dependence of Gafchromic EBT3 Film for Electron Beams.

作者信息

Inoue T, Sugimoto S, Fukata K, Kurokawa C, Ozawa S, Sasai K

机构信息

Juntendo University, Bunkyo-ku, Tokyo.

出版信息

Med Phys. 2012 Jun;39(6Part11):3735-3736. doi: 10.1118/1.4735200.

Abstract

PURPOSE

To evaluate the energy dependence of Gafchromic EBT3 film for establishing a quality assurance method of bolus electron conformal radiotherapy.

METHODS

We irradiated electron beam to EBT3 films, which were set in the water tank. The linear accelerator used was Varian Clinac 21EX. The energy of electron beams were 9 and 12 MeV. The irradiated field size was 10×10 cm and the source to surface distance was 100 cm. The depths of measurement were 22 (depth of dose maximum; dmax), 31, and 37 mm for 9 MeV and 28 (dmax), 43, and 50 mm for 12 MeV. The irradiated doses were 25, 50, 75, 100, 150, 200, and 300 cGy. EBT3 films were readout with a flat-bed scanner 48 hours after irradiation, and the optical density (OD) curve was obtained for each beam energy and depth. The OD curves were approximated by a third-order polynomial. The doses were evaluated at netOD 0.1 and 0.3 from the approximated curves.

RESULTS

The differences of the evaluated doses from those for 9 MeV at 22 mm depth were from 2 to 14 % for netOD=0.1, and from 1 to 13 % for netOD=0.3, respectively. The netOD curves of dmax for both energies showed good agreement, while large discrepancy was found in the deeper depths.

CONCLUSIONS

The dependence of dose response of EBT3 film on electron beam energy was small at dmax, while it increased at deeper depth in the present study. It can be considered that the discrepancy was caused by setup error because dose gradient was steeper at the deeper region. In future work, we will perform more precise measurement with a solid phantom to evaluate the energy dependence of EBT3 film.

摘要

目的

评估Gafchromic EBT3薄膜的能量依赖性,以建立电子束适形放疗的质量保证方法。

方法

我们将电子束照射到置于水箱中的EBT3薄膜上。使用的直线加速器是Varian Clinac 21EX。电子束能量为9和12 MeV。照射野大小为10×10 cm,源皮距为100 cm。9 MeV时的测量深度为22(剂量最大值深度;dmax)、31和37 mm,12 MeV时为28(dmax)、43和50 mm。照射剂量为25、50、75、100、150、200和300 cGy。照射48小时后,用平板扫描仪读取EBT3薄膜,并获得每种束流能量和深度下的光密度(OD)曲线。OD曲线用三阶多项式近似。根据近似曲线在净OD 0.1和0.3处评估剂量。

结果

在22 mm深度处,净OD = 0.1时,评估剂量与9 MeV时的剂量差异分别为2%至14%,净OD = 0.3时为1%至13%。两种能量下dmax的净OD曲线显示出良好的一致性,而在较深深度处发现了较大差异。

结论

在本研究中,EBT3薄膜的剂量响应在dmax处对电子束能量的依赖性较小,而在较深深度处增加。可以认为这种差异是由设置误差引起的,因为在较深区域剂量梯度更陡。在未来的工作中,我们将使用固体模体进行更精确的测量,以评估EBT3薄膜的能量依赖性。

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