State Key Lab of Solidification Processing, College of Materials Science and Engineering, Northwestern Polytechnical University, Xi'an, Shaanxi 710072, P. R. China.
Nanoscale. 2017 Jun 8;9(22):7429-7441. doi: 10.1039/c7nr00720e.
Metal/insertion-MoS sandwich interfaces are designed to reduce the Schottky barriers at metal-MoS interfaces. The effects of geometric and electronic structures of two-dimensional (2D) insertion materials on the contact properties of metal/insertion-MoS interfaces are comparatively studied by first-principles calculations. Regardless of the geometric and electronic structures of 2D insertion materials, Fermi level pinning effects and charge scattering at the metal/insertion-MoS interface are weakened due to weak interactions between the insertion and MoS layers, no gap states and negligible structural deformations for MoS layers. The Schottky barriers at metal/insertion-MoS interfaces are induced by three interface dipoles and four potential steps that are determined by the charge transfers and structural deformations of 2D insertion materials. The lower the electron affinities of 2D insertion materials, the more are the electrons lost from the Sc surface, resulting in lower n-type Schottky barriers at Sc/insertion-MoS interfaces. The larger the ionization potentials and the thinner the thicknesses of 2D insertion materials, the fewer are the electrons that accumulate at the Pt surface, leading to lower p-type Schottky barriers at Pt/insertion-MoS interfaces. All Sc/insertion-MoS interfaces exhibited ohmic characters. The Pt/BN-MoS interface exhibits the lowest p-type Schottky barrier of 0.52 eV due to the largest ionization potential (∼6.88 eV) and the thinnest thickness (single atomic layer thickness) of BN. These results in this work are beneficial to understand and design high performance metal/insertion-MoS interfaces through 2D insertion materials.
金属/插入-MoS 夹层界面旨在降低金属-MoS 界面的肖特基势垒。通过第一性原理计算,比较研究了二维(2D)插入材料的几何和电子结构对金属/插入-MoS 界面接触性质的影响。无论 2D 插入材料的几何和电子结构如何,由于插入层和 MoS 层之间的相互作用较弱、不存在带隙态以及 MoS 层的结构变形可以忽略不计,因此在金属/插入-MoS 界面处的费米能级钉扎效应和电荷散射都得到了减弱。金属/插入-MoS 界面处的肖特基势垒是由三个界面偶极子和四个位垒决定的,这取决于 2D 插入材料的电荷转移和结构变形。2D 插入材料的电子亲和能越低,从 Sc 表面失去的电子就越多,导致 Sc/插入-MoS 界面处的 n 型肖特基势垒越低。2D 插入材料的电离势越大且厚度越薄,在 Pt 表面积累的电子就越少,导致 Pt/插入-MoS 界面处的 p 型肖特基势垒越低。所有 Sc/插入-MoS 界面均表现出欧姆特性。由于 BN 的电离势(约 6.88 eV)最大且厚度(单层厚度)最薄,Pt/BN-MoS 界面表现出最低的 p 型肖特基势垒为 0.52 eV。这项工作的结果有助于通过 2D 插入材料理解和设计高性能的金属/插入-MoS 界面。