Kim Dong Yeon, Madridejos Jenica Marie L, Ha Miran, Kim Jun-Hyeong, Yang David ChangMo, Baig Chunggi, Kim Kwang S
Department of Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), 50 UNIST-gil, Ulsan 44919, Korea.
Chem Commun (Camb). 2017 Jun 1;53(45):6140-6143. doi: 10.1039/c7cc03116e.
Diatomic halogen molecules X (X = Cl/Br) favor the edge-to-face conformation on benzene with significant electrostatic interaction via halogen bonding. In contrast, they favor the stacked conformation on graphene with negligible electrostatic interaction. As the aromatic ring expands, the inner facial side becomes almost electrostatically neutral. On coronene, the two conformations are compatible.
双原子卤素分子X(X = Cl/Br)在苯上倾向于边对面构象,通过卤键存在显著的静电相互作用。相比之下,它们在石墨烯上倾向于堆叠构象,静电相互作用可忽略不计。随着芳环扩大,内表面几乎呈电中性。在蔻上,这两种构象是兼容的。