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晶格应变、位错和微观结构对YSZ薄膜输运性质的影响。

The effects of lattice strain, dislocations, and microstructure on the transport properties of YSZ films.

作者信息

Harrington George F, Cavallaro Andrea, McComb David W, Skinner Stephen J, Kilner John A

机构信息

Department of Materials, Imperial College London, London, SW7 2AZ, UK.

出版信息

Phys Chem Chem Phys. 2017 Jun 7;19(22):14319-14336. doi: 10.1039/c7cp02017a.

Abstract

Enhanced conductivity in YSZ films has been of substantial interest over the last decade. In this paper we examine the effects of substrate lattice mismatch and film thickness on the strain in YSZ films and the resultant effect on the conductivity. 8 mol% YSZ films have been grown on MgO, AlO, LAO and NGO substrates, thereby controlling the lattice mismatch at the film/substrate interface. The thickness of the films was varied to probe the interfacial contribution to the transport properties, as measured by impedance spectroscopy and tracer diffusion. No enhancement in the transport properties of any of the films was found over single crystal values, and instead the effects of lattice strain were found to be minimal. The interfaces of all films were more resistive due to a heterogeneous distribution of grain boundaries, and no evidence for enhanced transport down dislocations was found.

摘要

在过去十年中,氧化钇稳定氧化锆(YSZ)薄膜的导电性增强一直备受关注。在本文中,我们研究了衬底晶格失配和薄膜厚度对YSZ薄膜应变的影响以及对导电性的最终影响。8摩尔%的YSZ薄膜已生长在氧化镁、氧化铝、镧铝氧和钕镓氧衬底上,从而控制薄膜/衬底界面处的晶格失配。改变薄膜厚度以探究界面在传输特性方面的贡献,传输特性通过阻抗谱和示踪扩散来测量。未发现任何薄膜的传输特性比单晶值有所增强,相反,发现晶格应变的影响极小。由于晶界的不均匀分布,所有薄膜的界面电阻更大,并且未发现沿位错增强传输的证据。

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