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氙气场离子源来自单原子尖端。

Xenon gas field ion source from a single-atom tip.

机构信息

Department of Physics, National Taiwan University, Taipei 10617, Taiwan, Republic of China. Institute of Physics, Academia Sinica, Taipei 11529, Taiwan, Republic of China.

出版信息

Nanotechnology. 2017 Jun 23;28(25):255301. doi: 10.1088/1361-6528/aa6ed3. Epub 2017 May 26.

Abstract

Focused ion beam (FIB) systems have become powerful diagnostic and modification tools for nanoscience and nanotechnology. Gas field ion sources (GFISs) built from atomic-size emitters offer the highest brightness among all ion sources and thus can improve the spatial resolution of FIB systems. Here we show that the Ir/W(111) single-atom tip (SAT) can emit high-brightness Xe ion beams with a high current stability. The ion emission current versus extraction voltage was analyzed from 150 K up to 309 K. The optimal emitter temperature for maximum Xe ion emission was ∼150 K and the reduced brightness at the Xe gas pressure of 1 × 10 torr is two to three orders of magnitude higher than that of a Ga liquid metal ion source, and four to five orders of magnitude higher than that of a Xe inductively coupled plasma ion source. Most surprisingly, the SAT emitter remained stable even when operated at 309 K. Even though the ion current decreased with increasing temperature, the current at room temperature (RT) could still reach over 1 pA when the gas pressure was higher than 1 × 10 torr, indicating the feasibility of RT-Xe-GFIS for application to FIB systems. The operation temperature of Xe-SAT-GFIS is considerably higher than the cryogenic temperature required for the helium ion microscope (HIM), which offers great technical advantages because only simple or no cooling schemes can be adopted. Thus, Xe-GFIS-FIB would be easy to implement and may become a powerful tool for nanoscale milling and secondary ion mass spectroscopy.

摘要

聚焦离子束(FIB)系统已成为纳米科学和纳米技术的强大诊断和修改工具。由原子尺寸发射器制成的气体场离子源(GFIS)在所有离子源中提供最高的亮度,因此可以提高 FIB 系统的空间分辨率。在这里,我们展示了 Ir/W(111)单原子尖端(SAT)可以发射具有高电流稳定性的高亮度 Xe 离子束。从 150 K 到 309 K 分析了离子发射电流与提取电压的关系。对于最大 Xe 离子发射的最佳发射器温度约为 150 K,在 1×10 托的 Xe 气压下降低的亮度比 Ga 液态金属离子源高两到三个数量级,比 Xe 感应耦合等离子体离子源高四到五个数量级。最令人惊讶的是,即使在 309 K 下操作,SAT 发射器仍然稳定。尽管离子电流随温度升高而降低,但当气压高于 1×10 托时,室温(RT)下的电流仍可达到 1 pA 以上,表明 RT-Xe-GFIS 应用于 FIB 系统的可行性。Xe-SAT-GFIS 的工作温度远高于氦离子显微镜(HIM)所需的低温,这具有很大的技术优势,因为只能采用简单或无需冷却方案。因此,Xe-GFIS-FIB 将易于实现,并可能成为纳米级铣削和二次离子质谱的有力工具。

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