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通过快速的、一锅法超临界流体处理制备 BN-MoS 异质结构,增强超疏水性性能。

Enhanced Superhydrophobic Performance of BN-MoS Heterostructure Prepared via a Rapid, One-Pot Supercritical Fluid Processing.

机构信息

Functional Materials Division, CSIR-Central Electrochemical Research Institute , Karaikudi-630 003, Tamil Nadu, India.

出版信息

Langmuir. 2017 Jun 20;33(24):6159-6166. doi: 10.1021/acs.langmuir.7b00483. Epub 2017 Jun 6.

Abstract

Fabrication of highly crystalline BN-MoS heterostructure with >95% yield was demonstrated using one-pot supercritical fluid processing within 30 min. The existence of 20-50 layers of BN-MoS in the prepared heterostructure was confirmed by AFM analysis. The HR-TEM imaging and mapping analysis revealed the well-melded BN and MoS nanosheets in the heterostructure. The drastic reduction in XRD line intensities corresponding to the (002) plane and broadening of the peaks for the BN system over MoS indicated the effective exfoliation and lateral size reduction in BN nanosheets during SCF processing. Also, the exfoliated MoS nanosheets are preferentially exposed rather than BN nanosheets; consequently, the MoS nanosheets sturdily covered BN nanosheets in the heterostructure. The exfoliated BN and MoS nanosheets with nanoscale roughness make the surface highly hydrophobic in nature. As a result, the BN-MoS heterostructure showed superior superhydrophobic performance with high water contact angle of 165.9°, which is much higher than the value reported in the literature.

摘要

采用 30 分钟内的一步法超临界流体处理,成功制备了高结晶 BN-MoS 异质结构,产率>95%。通过原子力显微镜(AFM)分析证实,所制备的异质结构中存在 20-50 层 BN-MoS。高分辨率透射电子显微镜(HR-TEM)成像和mapping 分析表明 BN 和 MoS 纳米片在异质结构中很好地融合。对于 BN 体系,XRD 对应(002)平面的线强度急剧降低,而峰宽变宽,表明在 SCF 处理过程中 BN 纳米片的有效剥离和横向尺寸减小。此外,剥离的 MoS 纳米片优先暴露而不是 BN 纳米片;因此,MoS 纳米片在异质结构中牢固地覆盖 BN 纳米片。具有纳米级粗糙度的剥离 BN 和 MoS 纳米片使表面具有高度疏水性。因此,BN-MoS 异质结构表现出优异的超疏水性,水接触角高达 165.9°,远高于文献报道的值。

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