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单层 WSe2 在 Au 上的超快生长。

Ultrafast Growth of High-Quality Monolayer WSe on Au.

机构信息

Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang, 110016, P. R. China.

School of Materials Science and Engineering, University of Science and Technology of China, 72 Wenhua Road, Shenyang, 110016, P. R. China.

出版信息

Adv Mater. 2017 Aug;29(29). doi: 10.1002/adma.201700990. Epub 2017 Jun 6.

Abstract

The ultrafast growth of high-quality uniform monolayer WSe is reported with a growth rate of ≈26 µm s by chemical vapor deposition on reusable Au substrate, which is ≈2-3 orders of magnitude faster than those of most 2D transition metal dichalcogenides grown on nonmetal substrates. Such ultrafast growth allows for the fabrication of millimeter-size single-crystal WSe domains in ≈30 s and large-area continuous films in ≈60 s. Importantly, the ultrafast grown WSe shows excellent crystal quality and extraordinary electrical performance comparable to those of the mechanically exfoliated samples, with a high mobility up to ≈143 cm V s and ON/OFF ratio up to 9 × 10 at room temperature. Density functional theory calculations reveal that the ultrafast growth of WSe is due to the small energy barriers and exothermic characteristic for the diffusion and attachment of W and Se on the edges of WSe on Au substrate.

摘要

报道了一种通过化学气相沉积在可重复使用的 Au 衬底上生长高质量、均匀单层 WSe 的超快方法,其生长速率约为 26 µm s,比大多数在非金属衬底上生长的二维过渡金属二卤化物快 2-3 个数量级。这种超快生长使得在 ≈30 s 内可以制备毫米尺寸的单晶 WSe 畴,在 ≈60 s 内可以制备大面积连续薄膜。重要的是,超快生长的 WSe 表现出优异的晶体质量和非凡的电性能,可与机械剥离样品相媲美,室温下迁移率高达 ≈143 cm V s,ON/OFF 比高达 9 × 10。密度泛函理论计算表明,WSe 的超快生长是由于在 Au 衬底上 WSe 的边缘上 W 和 Se 的扩散和附着的小能垒和放热特性。

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