State Key Laboratory on Integrated Optoelectronics, Jilin University, Changchun 130012, People's Republic of China.
Nanotechnology. 2017 Sep 8;28(36):365505. doi: 10.1088/1361-6528/aa7bb8. Epub 2017 Jun 26.
A novel dark self-depleting ultraviolet (UV) photodetector based on a TiO/NiO pn heterojunction was demonstrated and exhibited lower dark current (I ) and noise. Both the NiO layer and Ni/Au composite electrode were fabricated by a smart, one-step oxidation method which was first employed in the fabrication of the UV photodetector. In dark, the depleted pn heterojunction structure effectively reduced the majority carrier density in TiO/NiO films, demonstrating a high resistance state and contributing to a lower I of 0.033 nA, two orders of magnitude lower than that of the single-material devices. Under UV illumination, the interface self-depleting effect arising from the dissociation and accumulation of photogenerated carriers was eliminated, ensuring loss-free responsivity (R) and a remarkable specific detectivity (D*) of 1.56 × 10 cm Hz W for the optimal device. The device with the structure of ITO/TiO/NiO/Au was measured to prove the mechanisms of interface self-depleting in dark and elimination of the depletion layer under UV illumination. Meanwhile, shortened decay time was achieved in the pn heterojunction UV photodetector. This suggests that the self-depleting devices possess the potential to further enhance photodetection performance.
一种基于 TiO/NiO pn 异质结的新型暗自耗尽紫外(UV)光电探测器被展示出来,并表现出更低的暗电流(I)和噪声。NiO 层和 Ni/Au 复合电极都是通过一种智能的一步氧化法制备的,这种方法首次应用于 UV 光电探测器的制造。在黑暗中,耗尽的 pn 异质结结构有效地降低了 TiO/NiO 薄膜中的多数载流子密度,表现出高电阻状态,有助于降低暗电流 I 至 0.033 nA,比单材料器件低两个数量级。在紫外光照射下,由于光生载流子的离解和积累而产生的界面自耗尽效应被消除,确保了无损耗的响应度(R)和卓越的特定探测率(D*)为 1.56×10 cm Hz W,对于最优的器件。通过 ITO/TiO/NiO/Au 结构的器件测量来证明在黑暗中的界面自耗尽机制和在紫外光照射下耗尽层的消除。同时,在 pn 异质结 UV 光电探测器中实现了缩短的衰减时间。这表明自耗尽器件具有进一步提高光电检测性能的潜力。