Pandit Bhishma, Parida Bhaskar, Jang Hyeon-Sik, Heo Keun
School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center, Jeonbuk National University, Jeonju 54896, Republic of Korea.
Nanomaterials (Basel). 2024 Mar 21;14(6):551. doi: 10.3390/nano14060551.
In this study, a self-powered broadband photodetector based on graphene/NiO/n-Si was fabricated by the direct spin-coating of nanostructured NiO on the Si substrate. The current-voltage measurement of the NiO/Si heterostructure exhibited rectifying characteristics with enhanced photocurrent under light illumination. Photodetection capability was measured in the range from 300 nm to 800 nm, and a higher photoresponse in the UV region was observed due to the wide bandgap of NiO. The presence of a top graphene transparent conducting electrode further enhanced the responsivity in the whole measured wavelength region from 350 to 800 nm. The photoresponse of the NiO/Si detector at 350 nm was found to increase from 0.0187 to 0.163 A/W at -1 V with the insertion of the graphene top layer. A high photo-to-dark current ratio (≃10) at the zero bias indicates that the device has advantageous application in energy-efficient high-performance broadband photodetectors.
在本研究中,通过在硅衬底上直接旋涂纳米结构的NiO制备了一种基于石墨烯/NiO/n-Si的自供电宽带光电探测器。NiO/Si异质结构的电流-电压测量显示出整流特性,在光照下光电流增强。在300纳米至800纳米范围内测量了光电探测能力,由于NiO的宽带隙,在紫外区域观察到更高的光响应。顶部石墨烯透明导电电极的存在进一步提高了在350至800纳米整个测量波长区域的响应度。发现在-1伏时,随着石墨烯顶层的插入,NiO/Si探测器在350纳米处的光响应从0.0187增加到0.163安/瓦。零偏压下的高光暗电流比(≃10)表明该器件在节能高性能宽带光电探测器中具有优势应用。