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氧对具有不同阳离子组成的非晶态锌锡氧化物形成高整流肖特基二极管的至关重要的作用。

Vital Role of Oxygen for the Formation of Highly Rectifying Schottky Barrier Diodes on Amorphous Zinc-Tin-Oxide with Various Cation Compositions.

机构信息

Felix-Bloch-Institut für Festkörperphysik, Universität Leipzig , Linnéstraße 5, 04103 Leipzig, Germany.

出版信息

ACS Appl Mater Interfaces. 2017 Aug 9;9(31):26574-26581. doi: 10.1021/acsami.7b06836. Epub 2017 Jul 26.

Abstract

We present electrical properties of Schottky barrier diodes on room-temperature deposited amorphous zinc-tin-oxide (ZTO) with Zn/(Zn + Sn) contents between 0.12 and 0.72. A combinatorial approach with continuous composition spread pulsed laser deposition is used to achieve the wide range of compositions with four samples each on 50 × 50 mm glass substrates. The Schottky barrier contacts were fabricated by the reactive direct-current sputtering of platinum. Best diode properties (rectification ratio S = 2.7 × 10, ideality factor η = 1.05, and effective barrier height ϕ = 1.25 eV) are obtained for a composition of 0.63 Zn/(Zn + Sn). Aging on the timescale of days and months is observed that leads to improved device properties (higher rectifications and lower ideality factors). In particular, the diodes with the lowest performance in the as-prepared state show the biggest improvements. The best diode properties after the aging process (S = 3.9 × 10, η = 1.12, and ϕ = 1.31 eV) were also observed for 0.63 Zn/(Zn + Sn).

摘要

我们展示了室温沉积的非晶态锌锡氧化物(ZTO)上肖特基势垒二极管的电学性能,其中 Zn/(Zn + Sn)的含量在 0.12 到 0.72 之间。采用组合式连续成分扩展脉冲激光沉积方法,在 50×50mm 的玻璃衬底上每个样品制备了四个,实现了广泛的成分范围。肖特基势垒接触通过反应直流溅射铂来制备。对于 Zn/(Zn + Sn)为 0.63 的组成,获得了最佳的二极管性能(整流比 S = 2.7×10,理想因子 η = 1.05,有效势垒高度 ϕ = 1.25eV)。在数天和数月的时间尺度上观察到老化现象,导致器件性能得到改善(更高的整流比和更低的理想因子)。特别是在初始状态下性能最低的二极管显示出最大的改进。在老化过程之后,最佳的二极管性能(S = 3.9×10,η = 1.12,ϕ = 1.31eV)也出现在 Zn/(Zn + Sn)为 0.63 的情况下。

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