CNRS/University of Pau and Pays de l'Adour , Institut des Sciences Analytiques et de Physico-chimie pour l'Environnement et les Matériaux, UMR5254, 2 Avenue du Président Angot, 64000 Pau, France.
CEA, DAM, DIF , F-91297 Arpajon, France.
Anal Chem. 2017 Sep 5;89(17):8791-8799. doi: 10.1021/acs.analchem.7b01041. Epub 2017 Aug 21.
The characterization of the aerosol (size, composition, and concentration) generated by Laser Ablation is of great interest due to its impact on the analytical performances when coupled to Inductively Coupled Plasma Mass Spectrometry (ICPMS). The capabilities of High Resolution ICPMS as a direct tool to characterize nanoparticles produced by femtosecond Laser Ablation of pure copper are presented. An analytical protocol, similar to the "single particle ICPMS" technique used to characterize the size distribution of nanoparticles in solution, was developed in order to observe the signals of individual particles produced by a single ablation shot. A Visual Basic for Applications (VBA) data processing was developed to count and sort the particles as a function of their size and thus determine the particle size distribution. To check the reliability of the method, the results were compared to a more conventional technique, namely, Electrical Low Pressure Impaction (ELPI) for 4000 shots. Detection limit for the particles produced by the laser ablation of a copper foil is of a few attograms corresponding to a nanoparticle of 14 nm. The direct online determination of particle size by ICPMS gave similar results than ELPI for copper particles ejected during the ablation shot by shot at a fixed spot, from 1 to 100 shots. Particles larger than 159 nm represented less than 1% of the aerosol whose distribution was centered on 25-51 nm.
由于激光烧蚀产生的气溶胶(尺寸、组成和浓度)对与电感耦合等离子体质谱(ICPMS)耦合时的分析性能有很大影响,因此对其进行特性描述非常重要。本文介绍了高分辨率 ICPMS 作为一种直接工具,用于表征飞秒激光烧蚀纯铜产生的纳米颗粒的能力。为了观察单个烧蚀产生的单个颗粒的信号,开发了一种类似于“单颗粒 ICPMS”技术的分析方案,用于表征溶液中纳米颗粒的尺寸分布。为了对颗粒进行计数和分类,开发了一个基于 Visual Basic for Applications(VBA)的数据处理程序,作为其尺寸的函数,从而确定颗粒尺寸分布。为了检查该方法的可靠性,将结果与更传统的技术(即用于测量 4000 个颗粒的电低压撞击(ELPI))进行了比较。通过激光烧蚀铜箔产生的颗粒的检测限为几个 attograms,对应于 14nm 的纳米颗粒。通过 ICPMS 直接在线测定颗粒尺寸的结果与在固定点逐个烧蚀射流时的 ELPI 相似,从 1 到 100 个射流。大于 159nm 的颗粒不到气溶胶的 1%,气溶胶的分布中心在 25-51nm。