SEU-FEI Nano-Pico Center, Key Lab of MEMS of Ministry of Education, Collaborative Innovation Center for Micro/Nano Fabrication, Device and System, Southeast University , Nanjing 210096, People's Republic of China.
Center for Advanced Materials and Manufacture, Joint Research Institute of Southeast University and Monash University , Suzhou 215123, People's Republic of China.
Nano Lett. 2017 Aug 9;17(8):5119-5125. doi: 10.1021/acs.nanolett.7b02498. Epub 2017 Jul 26.
With the rapid development of nanoscale structuring technology, the precision in the etching reaches the sub-10 nm scale today. However, with the ongoing development of nanofabrication the etching mechanisms with atomic precision still have to be understood in detail and improved. Here we observe, atom by atom, how preferential facets form in CaO crystals that are etched by an electron beam in an in situ high-resolution transmission electron microscope (HRTEM). An etching mechanism under electron beam irradiation is observed that is surprisingly similar to chemical etching and results in the formation of nanofacets. The observations also explain the dynamics of surface roughening. Our findings show how electron beam etching technology can be developed to ultimately realize tailoring of the facets of various crystalline materials with atomic precision.
随着纳米结构技术的飞速发展,如今的蚀刻精度已达到亚 10nm 尺度。然而,随着纳米制造技术的不断发展,仍然需要详细了解和改进具有原子精度的蚀刻机制。在这里,我们在原位高分辨率透射电子显微镜(HRTEM)中观察到,电子束蚀刻时 CaO 晶体优先形成晶面的原子级过程。我们观察到一种在电子束辐照下的蚀刻机制,它与化学蚀刻惊人地相似,导致了纳米晶面的形成。这些观察结果还解释了表面粗化的动力学。我们的研究结果表明,电子束蚀刻技术如何能够得到发展,最终实现对各种晶体材料晶面的原子级精确剪裁。