School of Material and Chemical Engineering, Tongren University, Tongren 554300, PR China.
Cumhuriyet University, Faculty of Science, Department of Chemistry, Sivas 58140, Turkey.
J Colloid Interface Sci. 2017 Nov 15;506:478-485. doi: 10.1016/j.jcis.2017.07.082. Epub 2017 Jul 22.
The mutually corroborated density functional theory (DFT) and molecular dynamics (MD) simulation methodology were employed to evaluate the inhibition performance of three thiourea derivatives (Inh1, Inh2, and Inh3) on carbon steel corrosion. Experimental results have shown that the corrosion rate follows the order: Inh3>Inh2>Inh1. Quantum chemical descriptors such as the frontier orbital energies (E and E), the energy gap between E and E (ΔE), dipole moment (μ), and Fukui index have been calculated and discussed. Some significant factors such as solvent, temperature, and coverage have been considered when investigating the adsorption of aforementioned thiourea derivatives on Fe(110) surface. Our results provide important atomic/molecular insights into the anticorrosive mechanism of inhibitor molecules, which could help in understanding the organic-metal interface and designing more appropriate organic corrosion inhibitors.
采用相互印证的密度泛函理论(DFT)和分子动力学(MD)模拟方法来评估三种硫脲衍生物(Inh1、Inh2 和 Inh3)对碳钢腐蚀的抑制性能。实验结果表明,腐蚀速率的顺序为:Inh3>Inh2>Inh1。计算并讨论了量子化学描述符,如前沿轨道能量(E 和 E)、E 和 E 之间的能隙(ΔE)、偶极矩(μ)和福井指数。在研究上述硫脲衍生物在 Fe(110)表面的吸附时,考虑了溶剂、温度和覆盖率等一些重要因素。我们的结果为抑制剂分子的防腐机制提供了重要的原子/分子见解,这有助于理解有机-金属界面并设计更合适的有机腐蚀抑制剂。