Liu H, Battiato S, Pellegrino A L, Paoli P, Rossi P, Jiménez C, Malandrino G, Muñoz-Rojas D
Univ. Grenoble Alpes, CNRS, Grenoble INP, LMGP, F-38000 Grenoble, France.
Dalton Trans. 2017 Aug 22;46(33):10986-10995. doi: 10.1039/c7dt01647f.
This work reports two new silver metalorganic precursors for the chemical vapor deposition of Ag metallic coatings. Both precursors are based on β-diketonate adducts, namely, Ag(hfac)(L) (H-hfac = 1,1,1,5,5,5-hexafluoro-2,4-pentanedione), where L is 1,10-phenanthroline (phen) or 2,5,8,11-tetraoxadodecane (triglyme). Using these ligands, the designed precursors have better solubility in alcoholic solvents and are less toxic and costly than previously reported ones. The new precursors have been characterized and their crystallographic structure solved. With the new triglyme precursor, [Ag(triglyme)][Ag(hfac)], pure metallic Ag coatings made of Ag nanoparticles about 20 nm in diameter were succesfully deposited on glass and Si substrates using Aerosol Assisted Metalorganic CVD (AA-CVD).
这项工作报道了两种用于化学气相沉积银金属涂层的新型银金属有机前驱体。这两种前驱体均基于β-二酮加合物,即Ag(hfac)(L)(H-hfac = 1,1,1,5,5,5-六氟-2,4-戊二酮),其中L为1,10-菲咯啉(phen)或2,5,8,11-四氧杂十二烷(三甘醇二甲醚)。使用这些配体,所设计的前驱体在醇类溶剂中具有更好的溶解性,并且比先前报道的前驱体毒性更低、成本更低。对新型前驱体进行了表征并解析了其晶体结构。使用新型三甘醇二甲醚前驱体[Ag(三甘醇二甲醚)][Ag(hfac)],通过气溶胶辅助金属有机化学气相沉积(AA-CVD)成功地在玻璃和硅衬底上沉积了由直径约20 nm的银纳米颗粒制成的纯金属银涂层。