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银化学气相沉积和原子层沉积前驱体：合成、性质及在沉积过程中的应用

Silver CVD and ALD Precursors: Synthesis, Properties, and Application in Deposition Processes.

作者信息

Vikulova Evgeniia S, Dorovskikh Svetlana I, Basova Tamara V, Zheravin Aleksander A, Morozova Natalya B

机构信息

Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Ac. Lavrentiev Ave. 3, 630090 Novosibirsk, Russia.

Meshalkin National Medical Research Center, Ministry of Public Health of the Russian Federation, Rechkunovskaya Str. 15, 630055 Novosibirsk, Russia.

出版信息

Molecules. 2024 Dec 3;29(23):5705. doi: 10.3390/molecules29235705.

DOI:10.3390/molecules29235705
PMID:39683864
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11643892/
Abstract

This review summarized the developments in the field of volatile silver complexes, which can serve as precursors in gas-transport reactions for the production of thin films and metal nanoparticles via chemical vapor deposition (CVD) and atomic layer deposition (ALD). Silver-based films and nanoparticles are widely used in various high-tech fields, including medicine. For effective use in CVD and ALD processes, the properties of silver precursors must be balanced in terms of volatility, thermal stability, and reactivity. In this review, we focus on the synthesis and comprehensive analysis of structural and thermal characteristics for the most promising classes of volatile silver complexes, as well as organometallic compounds. Following the specifics of silver chemistry, some features of the use of precursors and their selection, as well as several key directions to improving the efficiency of silver material deposition processes, are also discussed.

摘要

本综述总结了挥发性银配合物领域的进展，这些配合物可作为气体传输反应的前驱体，通过化学气相沉积（CVD）和原子层沉积（ALD）制备薄膜和金属纳米颗粒。银基薄膜和纳米颗粒广泛应用于包括医学在内的各种高科技领域。为了在CVD和ALD工艺中有效应用，银前驱体的性质必须在挥发性、热稳定性和反应活性方面达到平衡。在本综述中，我们重点关注最有前景的挥发性银配合物以及有机金属化合物的合成及其结构和热特性的综合分析。根据银化学的特点，还讨论了前驱体的一些使用特征及其选择，以及提高银材料沉积工艺效率的几个关键方向。

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