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用于KDP晶体超精密化学机械抛光的KDP水包油微乳液

KDP Aqueous Solution-in-Oil Microemulsion for Ultra-Precision Chemical-Mechanical Polishing of KDP Crystal.

作者信息

Dong Hui, Wang Lili, Gao Wei, Li Xiaoyuan, Wang Chao, Ji Fang, Pan Jinlong, Wang Baorui

机构信息

Institute of Machinery Manufacturing Technology, China Academy of Engineering of Physics (CAEP), Mianyang 621900, China.

出版信息

Materials (Basel). 2017 Mar 9;10(3):271. doi: 10.3390/ma10030271.

Abstract

A novel functional KH₂PO₄ (KDP) aqueous solution-in-oil (KDP aq/O) microemulsion system for KDP crystal ultra-precision chemical-mechanical polishing (CMP) was prepared. The system, which consisted of decanol, Triton X-100, and KH₂PO₄ aqueous solution, was available at room temperature. The functional KDP aq/O microemulsion system was systematically studied and applied as polishing solution to KDP CMP technology. In this study, a controlled deliquescent mechanism was proposed for KDP polishing with the KDP aq/O microemulsion. KDP aqueous solution, the chemical etchant in the polishing process, was caged into the micelles in the microemulsion, leading to a limitation of the reaction between the KDP crystal and KDP aqueous solution only if the microemulsion was deformed under the effect of the external force. Based on the interface reaction dynamics, KDP aqueous solutions with different concentrations () were applied to replace water in the traditional water-in-oil (W/O) microemulsion. The practicability of the controlled deliquescent mechanism was proved by the decreasing material removal rate (MRR) with the increasing of the . As a result, the corrosion pits on the KDP surface were avoided to some degree. Moreover, the roughnesses of KDP with KDP aq/O microemulsion ( was changed from 10 mM to 100 mM) as polishing solutions were smaller than that with the W/O microemulsion. The smallest surface root-mean-square roughness of 1.5 nm was obtained at a 30 mmol/L KDP aq solution, because of the most appropriate deliquescent rate and MRR.

摘要

制备了一种用于磷酸二氢钾(KDP)晶体超精密化学机械抛光(CMP)的新型功能性KH₂PO₄(KDP)水包油(KDP aq/O)微乳液体系。该体系由癸醇、Triton X - 100和KH₂PO₄水溶液组成,在室温下即可使用。对功能性KDP aq/O微乳液体系进行了系统研究,并将其作为抛光液应用于KDP CMP技术。在本研究中,提出了一种用KDP aq/O微乳液对KDP进行抛光的可控潮解机制。KDP水溶液作为抛光过程中的化学蚀刻剂,被包裹在微乳液的胶束中,只有在微乳液在外力作用下变形时,才会限制KDP晶体与KDP水溶液之间的反应。基于界面反应动力学,应用不同浓度()的KDP水溶液替代传统油包水(W/O)微乳液中的水。随着的增加,材料去除率(MRR)降低,证明了可控潮解机制的实用性。结果,在一定程度上避免了KDP表面的腐蚀坑。此外,以KDP aq/O微乳液(从10 mM变为100 mM)作为抛光液时,KDP的粗糙度小于以W/O微乳液作为抛光液时的粗糙度。在30 mmol/L KDP水溶液中,由于潮解速率和MRR最为合适,获得了最小表面均方根粗糙度为1.5 nm。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3674/5503384/c31f6b6466ed/materials-10-00271-g001.jpg

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本文引用的文献

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