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基于锗虚拟衬底的拉伸应变硅锗/锗多量子阱的室温电致发光

Room Temperature Electroluminescence from Tensile-Strained SiGe/Ge Multiple Quantum Wells on a Ge Virtual Substrate.

作者信息

Lin Guangyang, Chen Ningli, Zhang Lu, Huang Zhiwei, Huang Wei, Wang Jianyuan, Xu Jianfang, Chen Songyan, Li Cheng

机构信息

Department of Physics, OSED, Semiconductor Photonics Research Center, Xiamen University, Xiamen 361005, Fujian, China.

出版信息

Materials (Basel). 2016 Sep 27;9(10):803. doi: 10.3390/ma9100803.

Abstract

Direct band electroluminescence (EL) from tensile-strained SiGe/Ge multiple quantum wells (MQWs) on a Ge virtual substrate (VS) at room temperature is reported herein. Due to the competitive result of quantum confinement Stark effect and bandgap narrowing induced by tensile strain in Ge wells, electroluminescence from Γ1-HH1 transition in 12-nm Ge wells was observed at around 1550 nm. As injection current density increases, additional emission shoulders from Γ2-HH2 transition in Ge wells and Ge VS appeared at around 1300-1400 nm and 1600-1700 nm, respectively. The peak energy of EL shifted to the lower energy side superquadratically with an increase of injection current density as a result of the Joule heating effect. During the elevation of environmental temperature, EL intensity increased due to a reduction of energy between L and Γ valleys of Ge. Empirical fitting of the relationship between the integrated intensity of EL () and injection current density () with ~ shows that the m factor increased with injection current density, suggesting higher light emitting efficiency of the diode at larger injection current densities, which can be attributed to larger carrier occupations in the Γ valley and the heavy hole (HH) valance band at higher temperatures.

摘要

本文报道了在室温下,锗虚拟衬底(VS)上的拉伸应变硅锗/锗多量子阱(MQW)的直接带隙电致发光(EL)。由于量子限制斯塔克效应与锗阱中拉伸应变引起的带隙变窄的竞争结果,在12纳米锗阱中观察到了来自Γ1-HH1跃迁的电致发光,其波长约为1550纳米。随着注入电流密度的增加,锗阱中Γ2-HH2跃迁以及锗虚拟衬底分别在1300 - 1400纳米和1600 - 1700纳米左右出现了额外的发射峰。由于焦耳热效应,电致发光的峰值能量随着注入电流密度的增加超二次方地向低能量侧移动。在环境温度升高期间,由于锗的L谷和Γ谷之间的能量降低,电致发光强度增加。对电致发光积分强度()与注入电流密度()之间关系的经验拟合显示,m因子随注入电流密度增加,这表明在较大注入电流密度下二极管具有更高的发光效率,这可归因于在较高温度下Γ谷和重空穴(HH)价带中更大的载流子占据情况。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8c6c/5456644/2f27e2873810/materials-09-00803-g001.jpg

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