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硅基锗发光二极管的室温直接带隙电致发光

Room-temperature direct bandgap electroluminesence from Ge-on-Si light-emitting diodes.

作者信息

Sun Xiaochen, Liu Jifeng, Kimerling Lionel C, Michel Jurgen

机构信息

Microphotonics Center, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, USA.

出版信息

Opt Lett. 2009 Apr 15;34(8):1198-200. doi: 10.1364/ol.34.001198.

Abstract

We report what we believe to be the first demonstration of direct bandgap electroluminescence (EL) from Ge/Si heterojunction light-emitting diodes (LEDs) at room temperature. In-plane biaxial tensile strain is used to engineer the band structure of Ge to enhance the direct gap luminescence efficiency by increasing the injected electron population in the direct Gamma valley. Room-temperature EL is observed at the direct gap energy from a Ge/Si p-i-n diode exhibiting the same characteristics of the direct gap photoluminescence of Ge. The integral direct gap EL intensity increases superlinearly with electrical current owing to an indirect valley filling effect. These results indicate a promising future of tensile-strained Ge-on-Si for electrically pumped, monolithically integrated light emitters on Si.

摘要

我们报道了我们认为是室温下从锗/硅异质结发光二极管(LED)实现直接带隙电致发光(EL)的首次演示。利用面内双轴拉伸应变来设计锗的能带结构,通过增加直接Γ谷中的注入电子数量来提高直接带隙发光效率。在一个锗/硅p-i-n二极管的直接带隙能量处观察到室温EL,该二极管表现出与锗的直接带隙光致发光相同的特性。由于间接谷填充效应,积分直接带隙EL强度随电流超线性增加。这些结果表明,拉伸应变的硅基锗在用于硅上的电泵浦、单片集成发光器方面具有广阔的前景。

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