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无模板化学镀金纳米线:通过选择性形貌纳米结构的直接表面功能化用于电化学应用。

Template-Free Electroless Plating of Gold Nanowires: Direct Surface Functionalization with Shape-Selective Nanostructures for Electrochemical Applications.

机构信息

Department of Materials and Interfaces, Weizmann Institute of Science , Rehovot 7610001, Israel.

Department of Materials and Earth Sciences, Technische Universität Darmstadt , Alarich-Weiss-Straße 2, Darmstadt 64287, Germany.

出版信息

ACS Appl Mater Interfaces. 2017 Sep 13;9(36):31142-31152. doi: 10.1021/acsami.7b09398. Epub 2017 Aug 31.

Abstract

Metal nanowires (NWs) represent a prominent nanomaterial class, the interest in which is fueled by their tunable properties as well as their excellent performance in, for example, sensing, catalysis, and plasmonics. Synthetic approaches to obtain metal NWs mostly produce colloids or rely on templates. Integrating such nanowires into devices necessitates additional fabrication steps, such as template removal, nanostructure purification, or attachment. Here, we describe the development of a facile electroless plating protocol for the direct deposition of gold nanowire films, requiring neither templates nor complex instrumentation. The method is general, producing three-dimensional nanowire structures on substrates of varying shape and composition, with different seed types. The aqueous plating bath is prepared by ligand exchange and partial reduction of tetrachloroauric acid in the presence of 4-dimethylaminopyridine and formaldehyde. Gold deposition proceeds by nucleation of new grains on existing nanostructure tips and thus selectively produces curvy, polycrystalline nanowires of high aspect ratio. The nanofabrication potential of this method is demonstrated by producing a sensor electrode, whose performance is comparable to that of known nanostructures and discussed in terms of the catalyst architecture. Due to its flexibility and simplicity, shape-selective electroless plating is a promising new tool for functionalizing surfaces with anisotropic metal nanostructures.

摘要

金属纳米线(NWs)是一类重要的纳米材料,由于其可调的性质以及在传感、催化和等离子体等方面的优异性能,引起了人们的广泛关注。获得金属 NWs 的合成方法主要是产生胶体或依赖于模板。将这些纳米线集成到器件中需要额外的制造步骤,例如模板去除、纳米结构纯化或附着。在这里,我们描述了一种简便的无电电镀协议的发展,用于直接沉积金纳米线薄膜,既不需要模板也不需要复杂的仪器。该方法具有通用性,可以在不同形状和组成的基底上以及不同的种子类型上生成三维纳米线结构。水相电镀浴通过在 4-二甲氨基吡啶和甲醛的存在下配体交换和部分还原四氯金酸来制备。金的沉积通过在现有纳米结构尖端上的新晶粒成核进行,因此选择性地产生曲率高、高纵横比的多晶纳米线。通过制作传感器电极展示了该方法的纳米制造潜力,其性能可与已知的纳米结构相媲美,并根据催化剂结构进行了讨论。由于其灵活性和简单性,形状选择性无电镀是一种很有前途的新工具,可以将各向异性金属纳米结构功能化表面。

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