Gutiérrez-Hernández Rubén F, Bello-Mendoza Ricardo, Hernández-Ramírez Aracely, Malo Edi A, Nájera-Aguilar Hugo A
a Departamento de Ingeniería Química y Bioquímica , Instituto Tecnológico de Tapachula , Tapachula , Mexico.
b El Colegio de la Frontera Sur , Tapachula , Mexico.
Environ Technol. 2019 Jan;40(1):1-10. doi: 10.1080/09593330.2017.1375999. Epub 2017 Sep 19.
The capacity of the photo electro-Fenton (PEF) process to degrade a mixture of seven polychlorinated biphenyl (PCB) congeners was studied. Boron-doped diamond (BDD) sheets were used as anode and cathode in the experimental electrolytic cell that contained NaSO 0.05 M at pH 3 as supporting electrolyte for the electro generation of HO at the cathode. The effects of UV light intensity (254 and 365 nm), current density (8, 16 and 24 mA cm) and ferrous ion dosage (0.1, 0.2 and 0.3 mM) on PCB (C = 50 μg L) degradation were evaluated. The highest level of PCB degradation (97%) was achieved with 16 mA cm of current density, 0.1 mM of ferrous ion and UV light at 365 nm as irradiation source after 6 h of reaction. PCB28, PCB52 and PCB101 were not detected after 0.5, 1.5 and 3 h of reaction, respectively. The degradation of PCB138, PCB153, PCB180 and PCB209 was also high (>95%). The PEF system outperformed other oxidation processes (electro-Fenton, anodic oxidation, Fenton, photo-Fenton and UV photolysis) in terms of reaction rate and degradation efficiency. These results demonstrate for the first time the degradation of PCB209, the most highly chlorinated PCB congener, by an advanced electrochemical oxidation process.
研究了光电芬顿（PEF）工艺降解七种多氯联苯（PCB）同系物混合物的能力。在实验电解池中，以掺硼金刚石（BDD）片作为阳极和阴极，该电解池含有0.05 M的NaSO，pH值为3，作为阴极上电生成HO的支持电解质。评估了紫外光强度（254和365 nm）、电流密度（8、16和24 mA/cm）和亚铁离子用量（0.1、0.2和0.3 mM）对PCB（C = 50 μg/L）降解的影响。反应6小时后，以365 nm的紫外光为照射源，在电流密度为16 mA/cm、亚铁离子浓度为0.1 mM的条件下，实现了最高水平的PCB降解（97%）。反应0.5、1.5和3小时后，分别未检测到PCB28、PCB52和PCB101。PCB138、PCB153、PCB180和PCB209的降解率也很高（>95%）。在反应速率和降解效率方面，PEF系统优于其他氧化工艺（电芬顿、阳极氧化法、芬顿法、光芬顿法和紫外光解）。这些结果首次证明了通过先进的电化学氧化工艺可以降解多氯联苯中氯化程度最高的同系物PCB209。
