薄膜多层结构的激光加工：三维热模型与实验结果的比较

Laser processing of thin-film multilayer structures: comparison between a 3D thermal model and experimental results.

作者信息

Naghshine Babak B, Kiani Amirkianoosh

机构信息

Silicon Hall: Laser Micro/Nano Fabrication Facility, Department of Mechanical Engineering, University of New Brunswick, NB, Canada.

Department of Automotive, Mechanical and Manufacturing Engineering, University of Ontario Institute of Technology (UOIT), ON, Canada.

出版信息

Beilstein J Nanotechnol. 2017 Aug 24;8:1749-1759. doi: 10.3762/bjnano.8.176. eCollection 2017.

DOI:10.3762/bjnano.8.176

PMID:28904836

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5588606/

Abstract

In this research, a numerical model is introduced for simulation of laser processing of thin film multilayer structures, to predict the temperature and ablated area for a set of laser parameters including average power and repetition rate. Different thin-films on Si substrate were processed by nanosecond Nd:YAG laser pulses and the experimental and numerical results were compared to each other. The results show that applying a thin film on the surface can completely change the temperature field and vary the shape of the heat affected zone. The findings of this paper can have many potential applications including patterning the cell growth for biomedical applications and controlling the grain size in fabrication of polycrystalline silicon (poly-Si) thin-film transistors (TFTs).

摘要

在本研究中，引入了一个数值模型来模拟薄膜多层结构的激光加工过程，以预测包括平均功率和重复频率在内的一组激光参数下的温度和烧蚀面积。通过纳秒级钕:钇铝石榴石激光脉冲对硅衬底上的不同薄膜进行加工，并将实验结果与数值结果进行了比较。结果表明，在表面施加薄膜可以完全改变温度场，并改变热影响区的形状。本文的研究结果具有许多潜在应用，包括用于生物医学应用的细胞生长图案化以及在多晶硅（poly-Si）薄膜晶体管（TFT）制造中控制晶粒尺寸。