Hendow Sami T, Shakir Sami A
Multiwave Photonics, R. Eng. Frederico Ulrich 2650, 4470-605 Maia, Portugal.
Opt Express. 2010 May 10;18(10):10188-99. doi: 10.1364/OE.18.010188.
Ablation of silicon and metals is investigated using a 1064 nm pulsed fiber laser, with pulse energy up to 0.5 mJ, peak powers up to 10 kW, and pulse widths from 10 to 250 ns. A simple thermal model is employed to explain the dependence of scribe depth and shape on pulse energy or peak power. We demonstrate that pulses of high peak powers have shallow penetration depths, while longer pulses with lower peak powers have a higher material removal rate with deeper scribes. The key parameter that enables such variation of performance with changes in peak pulse power or peak irradiance on the material surface is the nonlinear increase of the absorption coefficient of silicon or metals as its temperature increases.
使用脉冲能量高达0.5 mJ、峰值功率高达10 kW、脉冲宽度为10至250 ns的1064 nm脉冲光纤激光器研究了硅和金属的烧蚀情况。采用一个简单的热模型来解释划刻深度和形状对脉冲能量或峰值功率的依赖性。我们证明,高峰值功率的脉冲具有较浅的穿透深度,而峰值功率较低的较长脉冲具有较高的材料去除率且划刻更深。随着材料表面峰值脉冲功率或峰值辐照度的变化,使性能产生这种变化的关键参数是硅或金属的吸收系数随其温度升高而非线性增加。